銦錫氧化物奈米片條透明導電塗膜製程改善

Process improvement of ITO nanostrips transparent conductive coatings

張家瑋(Chia-Wei Chang)

指導教授 ： 張朝欽

淡江大學/工學院/化學工程與材料工程學系碩士班/碩士(2014年)

https://doi.org/10.6846/TKU.2014.00738

摘要

本研究利用共沉澱法在室溫下製備銦錫氧化物奈米片條，經由高溫煆燒轉變成銦錫氧化物奈米片條。形成的銦錫氧化物粉體分散在丙醇中，加入壓克力黏合劑、界面活性劑和起始劑配置塗佈液，以刮刀塗佈在玻璃基板上，並經過紫外光或熱硬化後，真空烘烤可得ITO透明導電塗膜。在此研究中探討銦/錫比、煆燒條件、刮膜液成分、水解縮合時間、和刮膜方式對製作的塗膜片電阻和可見光平均穿透率的影響，在最佳條件下可得片電阻199 Ω/sq和穿透率92%的透明導電塗膜。放置在空氣中塗膜片電阻會慢慢升高，是因為空氣中水氣進入塗膜所造成。

關鍵字

銦錫氧化物 ； 共沉澱法 ； 複合塗膜 ； 紫外光硬化 ； 片電阻

並列摘要

Indium-tin hydroxide (ITH) nanostips were prepared by co-precipitation at room temperature and converted into indium-tin oxide (ITO) nanostrips after high-temperature calcination. The formed ITO powder was dispersed in 1-propanol and mixed with acrylic binder, surfactant, and initiator to get coating pastes. The coating pastes were coated on glass substrates by using a doctor-blade, and the resultant coatings were UV or thermal cured. The effects of the indium/tin ratio, calcination condition, coating paste composition, hydrolysis/condensation time, and coating method on sheet resistance and visible transmittance of the formed coatings were studied. In the extreme case, a coating with thickness of 1.5 μm sheet resistance of 199 Ω/sq and average visible transmittance of 92% could be prepared. The sheet resistance was increased in air environment because of entered moisture into the coating.

並列關鍵字

indium-tin oxide ； co-precipitation ； composite coating ； UV-curing ； sheet resistance

參考文獻

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