- 學位論文
以微光陣列進行相位曝光之研究
The Study of Phase Shift Used Exposure Using Pin Array Mask
摘要
本論文主要是研究以微光陣列進行相位曝光的技術，利用動態光罩的基本原理概念以及相位差規劃理論，將投影光源投射出的影像解析度能提升，使在快速原型製作應用能更精緻平滑，期望提高產品在市場上的多元運用。 研究經評估後，選用DLP投影機作為動態光罩的光源，結合選用的光學凸透鏡與變焦鏡頭，可以將1024x768像素經由0.55吋的DMD投射出40x30mm的圖案，並在過程中放置高解析度的微點陣列光罩，使影像透過微點陣列光罩後，影像像素變的細小，再聚焦成像於光硬化樹脂表面，針對過程中的微點陣列光罩對位、影像品質及光學設計做研究加以分析，找出最適當的各項數值，使整體實驗架構能完整呈現出高解析度的影像。 最後由投影出的影像圖形重疊比對的結果，討論影像相位差規劃理論的可行性，並針對影像模糊與色散及實驗機構的各項的缺失，提出改善的方法與未來研究的方向。
並列摘要
This paper focuses on the Phase Shift Used Exposure Using Pin Array Mask. The approach is by using basic dynamic mask concept and the phase difference planning theory to upgrade the image resolution from projecting source light. The DLP projector was chosen as the source light, and to cooperate with optical convex lens and zoom lens. For lessening the image pixel, setting a high resolution pin array mask during the process. After that, to find the optimum parameters about the position of the pin array mask, image quality and optical designing to show the high resolution image. Finally, to compare the results of projected image, discuss the feasibility of phase difference planning and offer improved way on blurring image, dispersion and experimental designing.