- 學位論文
反應式直流磁控濺鍍技術製備太陽能選性吸收模效率之研究
A Study of Solar Selective Absorber Efficiency by Reactive DC Magnetron Sputtering
摘要
太陽能選擇性吸收膜之研究係改善其效率品質，本論文的目的為使用鉻金屬及鉻化合物做為膜層結構，以連續式濺鍍系統製作太陽能選擇性吸收膜，且探討各膜層之光學特性及其厚度對吸收率與放射率(α/ε)比值之影響，並找出本實驗中的最佳製程參數。 目前大部分製作選擇性吸收膜以傳統電鍍及噴漆等方法，此法製作出的吸收膜壽命不長，亦會對環境造成污染，而本論文使用直流磁控濺鍍系統做為薄膜沉積的製程，膜厚設計則以光學薄膜設計軟體(Essential Macleod)找出最佳厚度。 驗證本實驗製備之太陽能選擇性吸收膜，其最佳吸收率與放射率比值(α/ε)為16.1，其中吸收率為0.805，放射率為0.05，實驗結果顯示各膜層厚度皆會對吸收率及放射率帶來影響，故需將膜厚控制在適當的厚度，以獲得較佳之效率。
並列摘要
A study of solar selective absorber improves the quality of efficiency. This thesis aims to use chromium and its compounds as the film structure, and to produce solar selective absorber by means of in-line sputter system. In addition, this thesis aims to probe the effect of optical characteristic and thickness on the ratio of absorptance to emittance(α/ε), and to find the most optimal process parameters in this experiment. At present, most productions of selective absorber are manufactured with traditional methods of electroplating and painting, which pollute the environment and do not last long. Different from the conventional methods, however, this thesis used DC magnetron sputtering system as the process and used the optical thin film design software (Essential Macleod) to find out the most optimal thickness. Verification of the solar selective absorber of this experiment is as follows: the best ratio of absorptance to emittance(α/ε) is 16.1, in which the absorptance is 0.805 and the emittance is 0.05. Results indicated that the thickness of every layer can influence the absorptance and emittance. Therefore, it should be restricted to the appropriate thickness to obtain the best efficiency.