- 學位論文
以射頻磁控濺鍍法於SKH9高速鋼表面漸進式複合鍍膜之研究
Gradient Layer Deposition of Composite Film On SKH9 by R.F. Magnetron Sputtering
摘要
單一鍍膜的功能性受限於材料特性，具有的功能特性不同，加上材料科學的蓬勃發展，難加工材料越來越多，在單層鍍膜在應用上已有不敷使用之趨勢。為了突破目前難題許多學者著手研究多元合金及多層系統，將幾個具有優異性質的材料結合產生新的鍍膜。利用類鑽碳膜之高硬度、高熱傳導率及低摩擦阻力等特性，提高基材之抗磨耗性及硬度，其中減少類鑽碳膜鍍層內應力與增加基材之附著性，可利用進行多層膜技術沉積薄膜與基材之間。 本研究以射頻磁控濺鍍法漸進式複合鍍膜Ti/TiN/TiCN/DLC披覆SKH9高速鋼上多層膜技術，並分析探討在不同膜層設計情況下，以SEM、XRD、Raman光譜等分析薄膜結構特性；以AFM、NIP、磨耗試驗等分析薄膜機械性質部份。 經實驗結果發現在SKH9高速鋼未鍍膜表面之平均粗糙度Ra=7.65 nm、硬度值為8.11 GPa，摩擦係數μ=0.47，而在表面漸進式複合披覆之類鑽碳膜可降低表面平均粗糙度Ra=0.80 nm及提高薄膜硬度達到28.67 GPa，摩擦係數μ=0.08。
並列摘要
For single layer is limited by the performance of material characters, less application can be done. For overcome this drawback, more and more research on multi-layer deposition were studied recently. By using the high hardness, high thermal conductivity and low friction coefficient of DLC film, it is possible to increase the hardness and abrasion resistance. Furthermore, by decreasing the internal stress and increasing the adhesive strength, it can be applied by processing multi-layer technique between the substrate and deposition layers. This research is based on R.F. Magnetron Sputtering process gradient layer deposition of Ti/TiN/TiCN/DLC film onto SKH9, then to discuss the film structure under different parameters by SEM, XRD and Raman Spectrum. Using AFM, NIP and wear test to analyzing the mechanical behavior. The result shows that the average roughness(Ra) for SKH9 without deposition film is 7.65 nm and the hardness is 8.11 GPa, the friction coefficient is 0.47. However, after applying multi-layers onto SKH9 the average roughness decreased to 0.80 nm and the hardness rised to 28.67 GPa and the friction coefficient declined to 0.08.