平面顯示器黑色矩陣用鉻金屬濺鍍靶材之顯微結構分析及薄膜特性研究

Microstructure Analysis and Sputtering Thin Film Properties for FPD Black Matrix Application

林修齊(Hsui-Chi Lin)

指導教授 ： 王錫福

國立臺北科技大學/工程學院/材料科學與工程研究所/碩士(2010年)

https://doi.org/10.6841/NTUT.2010.00462

摘要

隨著當代蓬勃發展的IT 產業，在日常生活中已使用各式各樣的顯示器，從數位照相機的顯示螢幕到行動電話、汽車導航系統及電視、個人電腦用途等廣泛的市場。對於彩色濾光片所要求的如大畫面化、高精細化、高品質、耐久性等在品質及性能方面皆有所提昇，為了使彩色濾光片能夠更加普及，還必需顧及成本。在彩色濾光片中黑色矩陣(BM)所使用的材料，從以前至今一直使用單層金屬鉻(Cr)膜。主要是因鉻薄膜與其他金屬的金屬薄膜相較之下其反射率較小，與玻璃基板之間的附著性較佳，且鉻薄膜可得到高光學密度。
本研究為針對鉻金屬靶材濺鍍參數及薄膜特性進行研究，首先以外購之商業鉻靶材開發彩色濾光片黑色矩陣之最佳參數，再進行自製鉻靶材測試驗證。由改變濺鍍功率與薄膜厚度，觀察鉻薄膜是否符合彩色濾光片黑色矩陣(Black matrix)遮光層之規範。結果顯示使用自製鉻靶材測試評估，鉻靶材製備鉻薄膜在最佳之濺鍍功率30 W製備出單層金屬鉻薄膜遮光層，其膜厚為130 nm，光學濃度(O.D.)為4.1，鉻薄膜沉積於康寧玻璃之反射率為59%，而在雙層金屬鉻(Cr)/氧化鉻(CrOx)薄膜之遮光層，其抗反射層之最佳化厚度為40 nm，光學濃度(O.D.)為4.04，反射率為3.83%， 印證自製鉻靶材所製備薄膜之光學性質符合商業靶材所製備之薄膜特性相符，製備出TFT-LCD彩色濾光片單層金屬鉻(Cr)與雙層結構金屬鉻(Cr)/氧化鉻(CrOx)之彩色濾光片黑色矩陣之遮光層。

關鍵字

濺鍍法 ； 彩色濾光片 ； 黑色矩陣 ； Cr薄膜

並列摘要

With the development of modern burgeoning Information Technology industry, various displays, from the screen of digital cameras, mobile phones, automobile navigation systems to television and personal computer, have widely been used in diverse markets. As for large screens, high refinement, high quality and durability color filters require, these demands effectively elevate the performance and quality of color filters. Also, to make color filters be more popular, we have to consider the cost of color filters. The materials of black matrix in color filters have long used single layer Chromium (Cr) films. The main reason is that when compared with metalized thin films of other metals, Cr thin films show lower reflectance, better adhesion between glass substrates, and higher optical density.
The research focuses on sputtering parameters of Cr metal target and properties of Cr thin films. We purchase commercial Cr target first to develop the best parameters of black matrix of color filter and then conduct sel-produce Cr target testing and certification. By changing the sputtering power and film thickness, we observe whether Cr thin films accord with black matrix as shading layer specification or not. The results indicate that homemade Cr target tested presents the optimal sputtering power of 30 W. produces single Cr thin film as a shading layer. The thickness of Cr thin films is 130 nm, optical density is 4.1 and the reflectance is 59%. The thickness of double layers of Cr/CrOx thin films as shading layers is 40 nm, optical density is 4.04 and the reflectance is 3.83%. The optical properties of thin films caused by sel-produce Cr target correspond to those of thin films caused by commercial Cr target. The single layer structure and the double layer structure of thin films are successful in manufacturing black matrix of color filters.

並列關鍵字

Sputtering ； Color filter ； Black matrix ； Cr thin film

參考文獻

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