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  • 學位論文

取像鏡頭之光學特性量測與分析

Optical Measurement and Analysis of Camera Lens

指導教授 : 林世穆
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摘要


對於定義系統之優劣,需要一個定量且能夠標準化的方法來檢驗其效能,才能使得評價方式達到統一及客觀的目的。以成像光學設計來說,雖然著重於像差的校正及平衡,但最後仍需要藉由適當的方法做全面性的像質評估才能確保整個光學系統的成像品質。而現今的光學量測領域中以MTF量測最為廣泛使用,比起傳統的量測方法更能夠提供一個妥善的分析。且不僅在定性或定量上提供了評測之可靠性,還能應用於系統之設計端及製造端。 本論文之研究目的在於了解MTF量測系統,並藉由廠商所提供之數顆鏡頭實際做量測分析。方法利用標靶圖樣以逆投影的方式來測定出邊緣擴散函數,再透過傅立葉轉換來計算出MTF圖表。而對於所有待測鏡頭的量測數據大致顯示出低空間頻率5 p/mm及10 lp/mm的曲線表現不錯,而在高空間頻率的20 lp/mm曲線在中心點及邊緣位置皆位於0.80及0.45之上,且40 lp/mm的中心點及邊緣位置也皆位於0.65及0.20之上。雖然可以從圖表看出鏡頭有些微的像散,但可以得知鏡頭的亮暗對比度及銳利度皆有一定水準。可以知道MTF量測分析的優點在於方便用來做出定量分析,但其實對於MTF量測技術在國際間還尚未統一化,因此在量測流程以及分析標準的制定上是未來必須完成的目標。

並列摘要


For valuing the capability of system, the measurement requires a standardized way and objective method to complete. In the design of imaging system, the work focuses on the balance of aberration. But it still needs to ensure the quality of the imaging by appropriate methods. Today, the most widely used in the field of optical measurements and analysis is MTF. Compared to traditional measurement methods, it can provide a proper analysis. Not only the qualitative evaluation, but can be applied in the design and manufacture. The study aims to understand the MTF measurement system and by the experiment to make the measurement analysis. By projecting the target pattern in order to determine the edge spread function, then through the Fourier transform to calculate the MTF chart. For almost lens show the lower spatial frequency 5 lp/mm and 10 lp/mm has good performance, and the higher spatial frequency 20 lp/mm at the center and edge position locate value 0.80 and 0.45, 40 lp/mm also at the center and edge position locates value 0.65 and 0.20. Although the lens has slight astigmatism, the high contrast and sharpness performance are good in imaging. Therefore the MTF measurement analysis has the advantage that easy to make a quantitative analysis. However, the measurement and process that must be standardize in the future.

參考文獻


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[8]Glenn D. Boreman, Modulation Transfer Function in Optical and Electro-Optical Systems, Washington, SPIE, 2001.
[10]W.T. Welford, Aberrations of optical systems, Boston: Adam Hilger, 1986.

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