斜向沉積二氧化矽薄膜之光特性研究

Study of the Optical Properties Based on the Glancing Angle Deposition Silicon Dioxide Thin Films

卓欽明(Chin-ming Cho)

指導教授 ： 陳隆建

國立臺北科技大學/電資學院/光電與能源產業研發碩士專班/碩士(2011年)

摘要

本研究係使用射頻磁控濺渡系統(Radio-Frequency magnetron sputtering system)以不同角度斜向沉積(Glancing Angle Deposition, GLAD) 二氧化矽(Silicon Dioxide ,SiO2)薄膜於矽(Silicon, Si)基板上，利用改變基板傾斜角方式，濺鍍不同角度之二氧化矽薄膜，觀察成長出來的二氧化矽(Silicon Dioxide ,SiO2)薄膜之表面與橫截面。隨著傾斜角度的增加，二氧化矽(Silicon Dioxide ,SiO2)薄膜的反射率會減少。最後利用以不同傾斜角度沉積，可以得到不同折射率之二氧化矽(Silicon Dioxide ,SiO2)薄膜的特性，以研究沉積角度對光特性之關係。這研究可應用到太陽能電池作為增加光萃取的薄膜。

關鍵字

斜向沉積 ； 二氧化矽 ； 射頻濺鍍

並列摘要

This study is use Radio-Frequency magnetron sputtering system to use as different angle oblique deposition SiO2 (Silicon Dioxide) thin films on Si (Silicon) wafer, to study about the relationship between the deposition angle and the optical properties.

並列關鍵字

GLAD ； SiO2 ； Sputter

參考文獻

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