- 學位論文
銅系赤銅鐵礦薄膜之製備及其抗菌特性之研究
Preparation of Cu-based delafossite thin films and its antibacterial properties
摘要
赤銅鐵礦p型透明導電氧化物(TCO)如CuYO2、CuCrO2與CuAlO2逐漸受到學者研究興趣而使p型TCO發展逐年成熟。而目前絕大部分赤銅鐵礦薄膜由真空設備沉積成膜，如脈衝雷射沉積(pulsed laser deposition, PLD)及磁控濺鍍法(Magnetron Sputtering)，其優點為成膜均勻、雜質含量少及特性佳等優點。相較之下以化學溶液法沉積赤銅鐵礦薄膜則具有製程簡便及設備需求低等優點。 故本實驗以化學溶液法及濺鍍法沉積n型及p型高能隙透明半導體，探討不同熱處理氣氛及溫度條件對其性質之影響。熱處理後試片以X光繞射分析儀分析結構、以UV-Visible分析穿透率、以四點探針及霍爾量測儀量測電性。 本實驗首次將p型透明半導體應用於透明抗菌塗層。利用其係p型寬能隙半導體光觸媒特性及其銅離子釋放之特性，成功製備透明抗菌塗層。根據台灣光觸媒產業發展協會TPIA-B1及ISO 22196規範進行赤銅鐵礦薄膜之抗菌特性之研究，其高抗菌效率及高穿透率性質在抗菌塗層具有良好的應用。
並列摘要
Transparent conducting oxides (TCOs) are attracting more and more attention. In general, most of the known TCOs are n-type materials. However, delafossite films, such as CuYO2, CuCrO2, and CuScO2, etc., have attracted considerable scientific and technological attention. Up to now, most delafossite films have been prepared by vacuum-based methods with advantages of the thin film uniformity, less impurity content and well performance, such as pulsed laser deposition (PLD) and magnetron sputtering. The advantages of delafossite thin films prepared by chemical solution deposition is the capability to coat materials of various shapes and large area, to control the composition easily for obtaining solutions of homogeneity and controlled concentration without using expensive equipment. Delafossite thin films are prepared on glass substrates by ratio frequency (rf) magnetron sputtering and chemical solution deposition. All the conditions in both deposition methods are investigated in order to produce delafossite thin films with better performance in conductivity and optical transmittance. Annealing conditions are investigated in order to produce delasossite phase p-type conductive thin films, such as ambient gas and temperature. The crystalline structure of thin films was confirmed by glancing incident angle X-ray diffraction. Field emission scanning electron microscope was used to observe the surface morphology and cross-section of thin films. The transmittance of the thin films in visible region was measured by UV-Visible spectrometer. The electrical properties were obtained by four-point-probe. The hole concentration and hole mobility were measured by Hall Effect Analyzer, respectively. In this research, the anti-bacterial properties of delafossite thin film surfaces against Escherichia coli (E. coli) bacteria were investigated. Copper based delafossite thin films were prepared on glass substrates by sputtering and chemical solution deposition, respectively. Annealing conditions, such as ambient gas and temperature, are investigated. The ISO 22196 method was utilized to evaluate the colony forming unit (CFU) of E. coli on the thin film surface after incubation. The experimental results show the thin film surface exhibiting superior antibacterial performance and high optical transparency of thin films. A novel transparent anti-bacterial coating has been first demonstrated in present study.