正交偏極式Mirau 干涉形貌量測儀之發展

白光干涉（WLI）是一種測量技術與長期的測量範圍和測量精度高。該技術採用寬帶頻譜的光。的表面輪廓重建的準確度確定的干涉圖的對比度和相干長度的光源。在本研究中，一種新型的Mirau干涉開發。發達的的Mirau分離光正交偏振的範圍和對象的手臂。兩種新型光學薄膜塗層以達到研究目的，即銀納米棒陣列（NRA）和反射波片。銀NRA被採用作為分束器和基準臂的正交偏振Mirau。同時採用反射型波片的干涉儀的參考臂旋轉的參考光的偏振正交的物體光。這使控制臂通過改變使用偏振器的入射光的偏振方向的光強度之間的比率。另一種偏光鏡配置前攝像頭，使物光和參考光之間的干擾。實驗結果表明，偏振分離技術的有效性每個極化分離器組件的可行性。標準樣品校準的平面反射鏡，標準的台階高度，和印刷電路板的凸塊，如測量的準確性的樣機。與常規WLI系統，以及作為參考點激光共焦測量系統的測量結果進行比較的一致性。測定結果同意從基準儀器的測量結果和在測量的可重複性可以達到降低到5 nm。從正交偏振Mirau得到的干涉對比度被證明是與低反射率的表面優於常規WLI。表面輪廓測量的工業樣品，如PCB板的液晶和彩色過濾器的技術可行性測試。

關鍵字

白光干涉儀；自動化量測；精密量測

並列摘要

White light interferometry (WLI) is a measurement technique with long measurement range and high measurement accuracy. The technique employs light with broadband spectrum. Accuracy of the surface profile reconstruction is determined by the contrast of the interferogram and coherence length of the light source. In this research, a new type of Mirau interferometer is developed. The developed Mirau separates light to the reference and object arm with an orthogonal polarization. Two kinds of novel optical thin film coating employed to achieve the research objective i.e. silver nanorod arrays (NRA) and reflective-type waveplate. Silver NRA is employed as the beam splitter and the reference arm of the orthogonal polarization Mirau. Meanwhile the reflective-type waveplate is employed in the reference arm of the interferometer to rotate the polarization of the reference light to be orthogonal to the object light. This enables control of the light intensity ratio between the arms by changing the polarization orientation of the incident light using a polarizer. Another polarizer is configured before the camera to enable interference between object and reference light. The experimental results show the feasibility of the polarization separation technique and the effectiveness of each polarization separator component. Standard samples such as calibrated flat mirror, standard step height, and PCB bumps are employed to measure the accuracy of the developed prototype. The consistency of the measurement results are compared with conventional WLI system as well as a point laser confocal measurement system as reference. The measurement results agree with the measurement results from the reference instruments and the repeatability of the measurement can reach down to 5 nm. The interferogram contrast obtained from the orthogonal polarization Mirau is proven to be superior to the conventional WLI for the surface with low-reflectivity. The feasibility of the technique is tested by measuring surface profile of industrial samples such as PCB boards and color filter of LCD.

並列關鍵字

white light itnerferometry ； surface profile measurement ； automatic optical inspection

參考文獻

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正交偏極式Mirau 干涉形貌量測儀之發展

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