以多光束多區同步掃描之無實體光罩微影技術於微快速原型製作

Applying Many Column Maskless Lithography Technology to Micro-RP System

張育源(Yu-Yuan Chang)

指導教授 ： 汪家昌

國立臺北科技大學/機電學院/機電整合研究所/碩士(2006年)

https://doi.org/10.6841/NTUT.2006.00405

摘要

在微快速原型(Micro RP)的技術中，現階段的國內外研究，多採用LCD或DLP的單槍投影技術進行動態光罩的產生與曝光，如果要保持微小特徵，來做較大尺寸的成型，則受限於固定的動態光罩解析度下，無法達到。而本研究主要目標為以光學運動系統改變固定解析度的動態光罩的照射方式，運用長焦成像的Telecentric Lens與實體光罩結合，將原本連續的像點分離，並以分離的像點為個別獨立的掃描點，同時以所具有的掃描點進行其周圍區域的掃描，使此動態光罩的解析度大幅提昇為原固定解析度的數倍。此多區同步掃描之無實體光罩曝光系統包括了硬體部分的光學微影掃描系統及軟體部分的光罩離散化。最後，本多區同步掃描之無實體光罩系統將進一步整合於液態樹脂硬化成型的上投式微快速原型系統，將各別光束區域掃描之影像結合成高解析快速原型的切層斷面影像，照射在可見光之光硬化樹脂上，以達到選擇硬化的目的，使製作出來的工件具有更高的解析度。

關鍵字

無光罩微影 ； 微快速原型 ； 動態光罩

並列摘要

In resent researches, LCD and DLP projector techniques have been used popularly to generate and project masks onto layers of Micro Rapid Prototype Systems (Micro RP). Due to the limitation of the resolution using LCD or DLP, the ratio of the part size and the feature size are restricted. In other words, it is impossible to build up a part with reasonable size and stay fine features. The main objective of this research is applying a Many - Column – Maskless – Lithography System (MCML) to alter the way of exposure by using fixed resolution dynamic mask. This system integrated Telecentric lens and physical mask to separate array of continual pixels of dynamic mask to array of individual spots. By controlling on/off of the array of spots, the scanning process will be carried out on the surrounding local area of every spot. It can be expected that the resolution can be increased remarkably. Practically, four times and nine times resolution increase will be introduced in this research. Further more, software has been developed to split every mask for local scanning. At the end, this MCML system has been integrated onto a liquid based Micro RP system to cure layers with both equitable size and fine features.

並列關鍵字

Maskless lithography ； Micro Rapid Prototyping ； Dynamic Mask

參考文獻

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