本篇論文主要探討使用模擬退火演算法來設計高解析度純相位式繞射光學元件時在演算法上所遇到的問題,在此我們所使用的退火計畫均為快速模擬退火(fast simulated annealing)。應用其演算法時將會遭遇到的問題包括有初溫、代價函數的設定及參數的特性等,為此,我們將模擬不同的系統參數以瞭解所設計出元件性能的高低關係,並且研究這些參數如何設定於高解析度的純相位式繞射光學元件。 另外,為了使液晶空間光調變器(LC-SLM)顯示其結果,我們將元件相位分佈轉換成0~255階的灰階變化,此元件的設計是使雷射光源經過繞射元件後,能夠成功的重建出期望的圖形。
In this thesis, wediscussed several issues regarding the designs of high-resolution phase-only diffractive optical elements(DOEs) using simulated annealing(SA) method. The SA scheme adopted here was the fast simulated annealing. The concerned issues include the effects of the initial and freezing temperature, cost function of design, and parameter characteristic. The simulation results of High-resolution DOEs that were designsed using various temperatures and cost function were presented and analyzed.Moreover, we discuss the relationship by annealing parameters. Furthermore,because we want to use a LC-SLM to display DOE to reconstruct the diffractive image, the phasedistribution,ranging from 0 to 2 of the phase-only DOE were converted into grayscaled integers,ranging from 0 to 255.At last,we successfully used the LC-SLM which replaced the DOEs to reconstruct different anticipative patterns by LASAR.