次微米級凹面光柵之研製與檢測

Development and Performance Measurement of a Concave Reflective Micro-Grating

鄭伯庭(Pao-Ting Cheng)

指導教授 ： 柯正浩

共同指導教授 ： 張明文(Ming-Wen Chang)

元智大學/電機通訊學院/光電工程研究所/碩士(2007年)

摘要

本研究主要探討以常見的積體電路製程設備製作出次微米尺度的凹面繞射光柵的可行性。研究結果顯示，此法與使用同步輻射X-ray的光源，SU-8高感光對比光阻的製程之成品相較，可大幅降低對於X-ray同步幅射光源與X-ray超精細微加工的依賴，並可在不使用LIGA與LIGA-like製程方式，直接進行批次量產，可降低數十倍之生產成本，能加速導入微光譜晶片商業化。

除此之外，文中針對微光機電系統之設計流程提出構想，能加速使用參數化設計以及參數尺寸研究之模型建立方式，以利於模型分析與分析後之設計變更，將有助於微機電系統與微光機電系統產業之設計合成與驗證分析。

關鍵字

次微米 ； 同步幅射 ； 凹面繞射光柵

並列摘要

We investigated that using ICP-RIE method to fabricate concave micro-grating. The major effort of this work is to design a process flow that is capable of fabricating a Si-based concave micro-grating. The full process flow includes the grating design process, the mask design process, the mask fabrication process and the grating fabrication process. Each part is discussed.

After the successful fabrication of the concave micro-grating, we setup a performance test and measurement system. A series of performance tests and measurements are carried out. The results of the measurements are compared with the results of the simulations.

並列關鍵字

ICP-RIE ； Concave ； Micro-grating

參考文獻

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