本實驗使用原子力顯微術在單層阻劑結構上,以機械力微影方式,結合蒸鍍與lift-off步驟,成功地在矽基板上製作出微區的奈米結構,有金奈米點陣列以及多種金屬奈米線陣列,而奈米線部份,包含金、銅、鈦以及鎳等金屬,最小線寬可達45nm的奈米線,此製作方式具有易操作、成本低、以及不受導電基板限制等優勢。此外,利用我們所製作出來奈米級的金屬陣列,以白光光源,在光學顯微鏡暗視野模式下,觀測到不同結構與不同金屬的區域表面電漿共振(LSPR)特性,拍得其散射光影像,並量測散射光譜,在金奈米點部分,於900℃下退火處理下,可聚成理想的球形(65nm),並得到散射光譜只有一個峰值位於551nm,與文獻上數據吻合。而在奈米線部份,發現所量得其光譜由兩個波峰所構成,分別為金線短軸(高度)與長軸(寬度)尺寸所造成的效應。
We successfully fabricate metal nanowire and nanodot arrays by a combination of atomic force microscopy nanomachining and lift-off process with the use of a single-layer resist on Si substrates. Various metal nanowires including Au, Cu, Ni and Ti with a smallest width down to 45 nm are created. The advantages of this process are easy-operation, low-cost, and no limitation to the use of a conducting substrate. The localized surface plasmon resonance (LSPR) images and spectra of the metal nanostructures are obtained by using an optical microscope under a dark field mode. For gold nanodots with a size of 65 nm, a single LSPR peak at about 551 nm is observed. Metal nanowires have two peaks due to oscillations in the long axis (width) and the short axis (height).