- 學位論文
以氨氣電漿處理提升氧化鋯鉿鐵電元件之可靠度
Enhanced Device Reliability for HfZrOx-based Ferroelectric MFM Capacitor by NH3 Plasma Treatment
延伸閱讀
- Yang, T. H. (2020). 鋁摻雜二氧化鉿之鐵電特性及二氧化鉿鋯元件之可靠度分析 [master's thesis, National Chiao Tung University]. Airiti Library. https://www.airitilibrary.com/Article/Detail?DocID=U0030-1504202111212380
- 蕭維志（2021）。負載於中孔洞碳材之釕金屬觸媒於氨氣合成反應之催化研究〔碩士論文，國立清華大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0016-2412202116182382
- Yu, C. Y. (2019). 以氨電漿處理及高真空退火對二氧化鉿相關介電層於矽鍺閘極堆疊之研究 [master's thesis, National Chiao Tung University]. Airiti Library. https://www.airitilibrary.com/Article/Detail?DocID=U0030-0306202016364376
- 洪若純（2018）。Ferroelectric HfZrOx Characteristics and Memory Applications〔碩士論文，國立臺灣師範大學〕。華藝線上圖書館。https://doi.org/10.6345/THE.NTNU.EPST.004.2018.E08
- 江仕弘（2021）。Characteristics of Double-layer Ferroelectric HfZrO2 for Planar-FET and GAA-FET〔碩士論文，國立臺灣師範大學〕。華藝線上圖書館。https://doi.org/10.6345/NTNU202101459