應用分子動力學模擬研究不同長寬比模具奈米壓印系統的加工行為

本研究主要是利用分子動力學模擬極性高分子PEO在熱壓式奈米壓印中的加工行為，探討不同長寬比模具對壓印系統特性的影響。首先取五種不同長寬比的模具，接著配合兩種降溫溫度去觀察在各種條件下高分子材料於壓印過程中的一個變形的情形。並利用密度分布、應力分布等性質來討論不同長寬比壓印的影響，並以這些性質來分析高分子變形、彈力回復的現象。最後探討壓印時模具與材料之間的互相作用力情形，探討摩擦力的影響，並重新設計一模具，改善在長寬比較大壓的較深的系統中，應力大量聚集的情形。

關鍵字

分子動力學模擬；奈米壓印；密度分布；相互作用力；應力分布

並列摘要

In this research, a molecular dynamics simulation model of thermoplastic nanoimprint lithography process is proposed. The model is imprinting a gold mould into a PEO film to study the polymer deformation behavior. The polymer deformation is observed in the thermoplastic nanoimprint lithography process by using five different aspect ratio moulds with two different cooling down temperatures. The distribution of stress and density in the systems is investigated to discuss the effect of the systems with different aspect ration moulds. The interacting forces are obtained by dividing the polymer into three regions between the polymer and the mould. Discuss about the friction effect in the systems. Finally, redesign a new mould trying to improve the phenomenon that the large stress couldn’t release completely in old nanoimprint process.

並列關鍵字

Molecular dynamics ； nanoimprint ； density distribution ； interacting force ； stress distribution

參考文獻

1. Feynman, R.P., Lectures on Physics. 1963. 1: p. 3-6.

3. Binnig, G., et al., Tunneling through a controllable vacuum gap. applied Physics Letters, 1982. 40: p. 178.

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8. Chou, S.Y., P.R. Krauss, and P.J. Renstrom, Imprint of sub-25 nm vias and trenches in polymers. Appl. Phys. Lett., 1995. 67(21): p. 3114-3116.

10. Huang, X.D., et al., Reversal imprinting by transferring polymer from mold to substrate. J. Vac. Sci. Technol. B, 2002. 20(6): p. 2872.

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應用分子動力學模擬研究不同長寬比模具奈米壓印系統的加工行為

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