Stress Relaxation of V-shaped Notch on Single Crystal Silicon using Nanoholes

運用奈米洞分散單晶矽V型裂紋之應力集中

黃川桐

指導教授 ： 葉哲良

國立清華大學/工學院/奈米工程與微系統研究所/碩士(2009年)

https://doi.org/10.6843/NTHU.2009.00437

摘要

This thesis investigates a surface nanohole toughening method which relieves stress concentration around the V-shaped notch. Using electroless metal deposition, this work fabricates the above mentioned structure, and matains the single crystal silicon properties.
The anisotropic etchant TMAH etches along the specific crystal direction and forms a V-shaped notch with a groove degree of 70.53°. This notch dominates the whole fracture behavior; only the crack propagates along this notch. The rupture load of bare Si is about 30.9 N. Depth of the V-shaped notch after forming is 2 μm, and the rupture load is 18.1 N; when depth reaches 14 μm, the rupture load decreases to 6.3 N.
Nanoholes form on the pre-notch plate, designing three different depth nanoholes : half of notch depth; equal to notch depth; one half of notch depth. According to a three point bending test, when nanohole depth is half of notch, it recovers and toughens the plate. The strength of 2 μm and 14 μm plate both enhance by nanoholes to 2.62 times and 5.57 times individually.

關鍵字

應力集中 ； 奈米洞增韌法 ； 無電極金屬蝕刻 ； V型裂紋

並列摘要

無資料

並列關鍵字

stress concentration ； nanohole toughening ； electroless metal deposition ； V-notch

參考文獻

[1] C. Wilson, A. Ormeggi, and M. Narbutovskih, "Fracture testing of silicon microcantilever beams," Journal of Applied Physics, vol. 79, p. 2386, 1996.

[3] P. Ferreira and J. Rogers, "Printable Single-Crystal Silicon Micro/Nanoscale Ribbons, Platelets and Bars Generated from Bulk Wafers*," Adv. Funct. Mater, vol. 17, pp. 3051-3062, 2007.

[4] D. Khang, H. Jiang, Y. Huang, and J. Rogers, "A stretchable form of single-crystal silicon for high-performance electronics on rubber substrates." vol. 311: American Association for the Advancement of Science, 2006, pp. 208-212.

[5] J. Lee, N. Lakshminarayan, S. Dhungel, K. Kim, and J. Yi, "Optimization of fabrication process of high-efficiency and low-cost crystalline silicon solar cell for industrial applications," Solar Energy Materials and Solar Cells, vol. 93, pp. 256-261, 2009.

[6] C. Sun, W. Min, N. Linn, P. Jiang, and B. Jiang, "Templated fabrication of large area subwavelength antireflection gratings on silicon," Applied Physics Letters, vol. 91, p. 231105, 2007.