製作奈米模板觀察在侷限效應下嵌段共聚物之自組裝現象

Fabrication of Nano-Templates for Observing Self-Assembly of Block Copolymers in Confined Structures

邱雯郁(Chiu, Wen Yu)

指導教授 ： 李明昌

國立清華大學/電機資訊學院/光電工程研究所/碩士(2016年)

摘要

本研究結合由“top-down”微影製程所得到不同形貌的奈米模板以及“bottom-up”的嵌段共聚物自組裝方法來得到一個大面積且具有序性的奈米結構。
在第一版奈米模板中，我們以沉積硬遮罩取代光阻、調整蝕刻氣體參數以及事先成長蝕刻終點的方式，得到擁有垂直側壁、平坦底部以及改善微溝渠現象的奈米模板；而在奈米模板尺寸及圖形的優化上，第二版奈米模板利用電子束微影系統搭配製程的垂直整合得到週期為250奈米的奈米光柵結構，第三版奈米模板則是透過多重曝光的方式改善正方形及六角形結構的角落圓滑現象。

關鍵字

奈米模板 ； 多重微影 ； 聚苯乙烯-聚二甲基矽烷 ； 自組裝

並列摘要

In this study, we combine the “top-down” lithography process and “bottom-up” self-assembly of block copolymer approach to generate nano-structure with well-oriented periodic arrays over large area.
The first nano-template is a periodic Si grating made by dry etching, where a SiO2 layer is used as a hard mask to define the grating structure. We modify the concentration of process gases during etching, a steep sidewall and flat surface at the bottom of trenches is achieved. The second nano-template is with a grating feature size down to 50 nm, which is fabricated by e-beam lithography and a sidewall coating technique. The 3rd nano-template is square and hexagonal sharp-angle wells fabricated through multi-step photolithography. Then we take a process similar to making the second nano-template to get the final structure.

並列關鍵字

Nano-Templates ； Multi-Step Photolithography ； PS-PDMS ； Self-Assembly

參考文獻

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