中空陰極式電漿源之研究

Study of a Hollow Cathode Plasma Source

李才郎(Tsai-Lung Lee)

指導教授 ： 寇崇善

國立清華大學/理學院/物理學系/碩士(2012年)

https://doi.org/10.6843/NTHU.2012.00376

摘要

碳汙染會影響電子顯微鏡的解析度，為此本論文建立中空陰極式電漿源系統，希望將來能應用於電子顯微鏡的清潔。實驗內容包括以Langmuir Probe觀察電漿特性如電漿密度及電子溫度；觀察氧氣、氫氣、空氣電漿在各種環境下的OES光譜；觀察PVC受Downstream電漿處理的水滴角變化，與Langmuir Probe量測和OES量測做比較。研究結果我們可以低頻、低功率方式點起中空陰極式電漿，並且證實電漿可與碳氫物進行反應。實驗結果顯示在40 mTorr、60 W即可點起電漿，密度可達1011 cm-3，距離電漿源18 cm處密度仍有1010 cm-3。PVC受電漿處理後水滴角下降，在距離電極18 cm處最多可從75°降至11°，在28 cm處最多可降至22°。

關鍵字

中空陰極

並列摘要

無資料

並列關鍵字

hollow cathode ； plasma

參考文獻

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