- 學位論文
具Ti-Ge-O介面層之N型鍺接觸電阻研究
A study on n-Ge contact with Ti-Ge-O interfacial layer
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延伸閱讀
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- Chen, W. Y. (2007). 異質接面鍺通道電晶體及矽鍺光電元件之探討 [master's thesis, National Taiwan University]. Airiti Library. https://doi.org/10.6342/NTU.2007.10189
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- 張佑安（2010）。Process Study of Higher-k Gate Stack Dielectrics and Interfacial layer for MOS Devices〔碩士論文，國立清華大學〕。華藝線上圖書館。https://doi.org/10.6843/NTHU.2010.00103
- 許雅音（2011）。Process Study of Higher-k Gate Dielectric Stacks and Interfacial layer for MOS Devices〔碩士論文，國立清華大學〕。華藝線上圖書館。https://doi.org/10.6843/NTHU.2011.00150