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  • 學位論文

以化學氣相沉積法成長鋁摻雜氧化鋅奈米柱之研究

Al doped ZnO nanorod growth by chemical vapor deposition

指導教授 : 許經夌

摘要


本實驗是以化學氣相沉積法(Chemical Vapor Deposition, CVD)成長氧化鋅奈米棒,並討論摻雜鋁其表面形貌、光學特性。 本實驗分別在不同的材料上成長奈米柱。從場發式電子顯微鏡 (Field-emission scanning electron microscopy, FE-SEM)得知在金薄膜上成長的奈米柱其直徑約為100 nm,長度約為5 μm。在金粒子上成長的奈米柱的直徑約為100 nm,長度約為3 μm。在ZnO seed layer上成長的氧化鋅奈米柱其直徑約為250 nm,長度約為4.5μm。在ZnO seed layer上成長的氧化鋅鋁奈米柱其直徑約為50 nm,長度約為28 μm。AZO seed layer上成長的氧化鋅奈米柱以AZO 3%的效果最好,其直徑約為330 nm,長度約為3.7 μm。在AZO 3% 的seed layer上成長的氧化鋅鋁奈米柱。其奈米柱直徑約為250 nm,長度約為8.22 μm。摻雜鋁元素可以使奈米柱直徑變短,長度增加。從XRD(X-ray diffraction)分析得知,在seed layer上成長的奈米柱主要沿著(002)面成長,這也代表奈米柱大多垂直於基板面生長。室溫PL 的量測結果發現氧化鋅奈米柱主要螢光訊號為380 nm(UV emission)、500 nm(缺陷發光)。缺陷發光的原因與鋅氧錯位(oxide antisite, OZn )有關。 我們將n-type的氧化鋅奈米柱成長在p-type氮化鎵上,再將ITO導電玻璃蓋上氧化鋅奈米柱上,提供電壓即可發出藍光LED。

並列摘要


In this study, AlZnO nanorods were synthesized on silicon (100) substrates with different seed layer by chemical vapor deposition (CVD) technique. The morphologies and nanostructures were characterized by field-emission scanning electron microscopy (FE-SEM) and X-ray diffraction (XRD). The optical properties were analyzed by room temperature photoluminescence (PL).We successfully fabricated n-type ZnO nanorods on a p-type GaN. And also we use a simple technique to create a light-emitting device.

並列關鍵字

ZnO nanorod chemical vapor deposition

參考文獻


[13] 詹長恩, 以有機金屬化學氣相沉積法成長氧化鋅薄膜, 中 原 大 學電子工程學系, 2008
[1] D. Kim, W. Han, B. Kong, H. Cho, and C. Hong, “Fabrication of the hybrid ZnO LED structure grown on p-type GaN by metal organic chemical vapor deposition,” Physica B: Condensed Matter, vol. 401-402, pp. 386-390, 2007.
[2] W. S. Han, Y. Y. Kim, B. H. Kong, and H. K. Cho, “Ultraviolet light emitting diode with n-ZnO : Ga / i-ZnO / p-GaN : Mg heterojunction,” Thin Solid Films, vol. 517, no. 17, pp. 5106-5109, 2009.
[3] X.-M. Zhang, M.-Y. Lu, Y. Zhang, L.-J. Chen, and Z. L. Wang, “Fabrication of a High-Brightness Blue-Light-Emitting Diode Using a ZnO-Nanowire Array Grown on p-GaN Thin Film,” Advanced Materials, vol. 21, no. 27, pp. 2767-2770, 2009.
[4] D. Kim, I. Yun, and H. Kim, “Fabrication of rough Al doped ZnO films deposited by low pressure chemical vapor deposition for high efficiency thin film solar cells,” Current Applied Physics, vol. 10, no. 3, p. S459-S462, 2010.

被引用紀錄


陳可緯(2013)。金催化成長氧化鋅奈米線結構之變功率光致螢光光譜研究〔碩士論文,中原大學〕。華藝線上圖書館。https://doi.org/10.6840/cycu201300940
張振隆(2012)。氧化鋅奈米梳的上轉換螢光〔碩士論文,中原大學〕。華藝線上圖書館。https://doi.org/10.6840/cycu201200318

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