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  • 學位論文

精實六標準差應用微位相差膜製程之成本降低

The Improvement of Patterned Retarder Process on Cost Reduction Using Lean Six Sigma Approach

指導教授 : 何青原
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摘要


本研究利用精實六標準法D(定義)、M(量測)、A(分析)、I(改善)、C(控制)其改善流程架構。在定義階段,目標設定將現行彩色濾光片之微位相差膜每片成本降低8%。在量測階段,確認機台跟機台和樣本之間量測無變異性,並以製程能力分析微位相差膜光阻製程能力穩定,符合常態無偏移趨勢。在分析階段,利用樹狀圖進行三階資料分析,確認潛在因子,將要因進行C&E Matrix評分,評定優先順序,進行驗證,選擇主要因子第二家微位相差膜光阻導入之B光阻進行假設檢定,假設結果B光阻導入,Cost明顯改善,為顯著因子。在改善階段,進行第二家微位相差膜光阻導入之B光阻,光學、可靠度及小中量CELL/Module良率驗證,驗證結果光學特性和良率同A光阻規格無差異性。在控制階段,導入B光阻,並達成定義階段所設定目標,每片成本由8%降低至17.62%,以精實六標準差法驗證方式,導入B光阻其單價較A光阻低且光學特性以及良率同原量產品之A光阻,降低生產成本,進而提高產品競爭力。

並列摘要


This research helps to improve procedure structure by Lean Six Sigma: Define, Measure, Analyze, Improve and Control. At definition stage, the aim is to reduce the cost on the patterned retarder of color filter. At measurement stage, make sure there is no difference between the machine and sample. Stabilize the patterned retarder by Process Capability Analysis and meet the normality and no offset tendency. Stage 3: analysis the data by tree diagram, divide the data into three steps process to identify latency, main factor and obvious factor. Take the factor to do the C&E Matrix scored to evaluate the priority, examination and determine the main factor. Hypothesis test: Implement B photoresist to 2nd Source Lean Six Sigma. The obvious factor would be significant cost reduction due to importing B photoresist. Stage 4 improvement: Implement B photoresist, optics, reliability and small CELL/Module yield rate to 2nd Source Lean Six Sigma, the simulation result proves optics and yield rate make no difference with A photoresist. Last stage control: There’s 8% to 17.62% cost reduction by implementing B photoresist. According to Lean Six Sigma, the unit price for B photoresist is lower than A with no impact to optics and yield rate. It reduces not only the cost but also promote the competitiveness.

並列關鍵字

Lean Six Sigma Photoresist Patterned retarder Factor

參考文獻


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