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  • 學位論文

應用微機電製程之犧牲層技術製作微過濾結構

Applying the Sacrificial Layer Technique of MEMS Process for the Fabrication of Microfliter

指導教授 : 張耀仁
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摘要


由於半導體的產業的蓬勃發展,進而帶動微機電相關領域的科學研究,在人類基因解碼的逐漸完成的同時,生醫方面的研究備受重視,生物晶片就是這樣時代下所誕生的科技產物。有別於以往生醫檢測的曠日費時,生物晶片的研發的目的就是為了改善生醫檢測相關方面的缺點,進而提供一個更有效率且精準的檢測結果。在檢測過程中純化技術對於檢驗及實驗的效率提升有著舉足輕重的影響,所以實驗前物質純化及實驗後過濾去除雜質就變成一個值得探討的課題,在生物晶片上負責此一任務的就是微過濾器。本研究就是針對此一元件將其結構以微機電技術,利用矽基做為過濾器的基材,運用犧牲層技術和微影製程製作結構,由犧牲層厚度來控制篩選的特徵尺寸,元件製作主要使用的材質為SU-8 厚膜負光阻,犧牲層方面則是分別使用正光阻的AZ4620 和RP4000,運用正負光阻間的化學特性的差異來製作,關鍵技術在於只要準確控制旋塗犧牲層轉速的和選用合適黏滯係數的光阻液,並且加上注意不同光阻間曝光的先後順序及曝光顯影的時間掌控,就可準確製作出需要的相關特徵過濾尺寸,相較於傳統微加工需要蝕刻及沉積金屬而言,其製作成本大大降低,當中也可以避免製程中搬運不同機台或是環境間行進間的汙染,進而提高的製程良率。

並列摘要


Biochip plays an important role in biotechnology and many scientists also pay a lot of attention on this product. Due to the development of the semiconductor manufacture and the achievement of MEMS technique, the design and research of biochips have become more and more popular. Moreover, purification and filtration of test samples have been always important issues in the field of biotechnology. These processes will deeply affect the result of the experiment. Thus, in this study we used MEMS and sacrificial layer techniques to manufacture the microfilter. It only depends on different development properties of the positive and negative photoresists. The feature size of filtration can be precisely controlled by the thickness of sacrificial layer. The main materials for this study are just photoresists, such as negative photoresist SU-8 and positive photoresists AZ4620 and RP4000. The fabrication process was carried out in the yellow room. Compared with the traditional micromachining methods such as bulk micromanufacturing, surface micromachining and the LIGA process, this proposed design and fabrication of microfilter have many advantages including economical fabrication cost and high yield.

參考文獻


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被引用紀錄


Wang, J. H. (2010). 以微機電製程製作主動式微幫浦過濾晶片 [master's thesis, Chung Yuan Christian University]. Airiti Library. https://doi.org/10.6840/cycu201000825

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