四氟甲烷/八氟環丁烷混合電漿製備奈米片狀結構之超疏水及疏油薄膜研究

Deposition of Super-Hydrophobic and Oleophobic Teflon-like Film with Nanowall Structure by CF4/C4F8 Mixed Plasma

曾靖富(Ching-Fu Tseng)

指導教授 ： 魏大欽

中原大學/工學院/化學工程研究所/碩士(2019年)

https://doi.org/10.6840/cycu201900744

摘要

本研究利用四氟甲烷(CF4)與八氟環丁烷(C4F8)混合氣體電漿進行表面鍍膜，提高基材之疏水及疏油特性，探討電漿改質時間、基材擺放位置、高度、基材種類等參數對基材表面疏水及疏油性質的影響。並利用WCA、SEM、XPS、FTIR等儀器分析表面物理形態與化學組成之變化，搭配電漿放射光譜儀（OES）分析電漿中物種濃度的變化。
首先以微波電漿對玻璃基材進行表面改質，發現改質後表面具有粗糙的表面可以使得表面達到超疏水的特性。由FTIR分析中可發現電漿沉積膜有大量之CF2鍵結，因此推斷表面有超疏水現象是由於氟碳官能基的鍵結以及表面粗糙度的形成有關。
接著改變原本玻璃基材的水平擺放方式，分別為墊高基材位置及垂直擺放，結果發現沉積的奈米片狀結構更為密集，使表面更加粗糙也更為疏水，推測是因為新的擺放方式造成流場的變化，質傳邊界層厚度因而變小，增加了CF2自由基的表面濃度。
最後使用不易被含氟電漿蝕刻的銅片基材來進行改質，探討整個圓管式反應器內各個擺放位置的改質特性，結果顯示，成膜的現象大致呈現對稱，放置在中央放電區(discharge region)的銅片因離子轟擊劇烈，成膜速率極慢，且沉積膜以C-C鍵結為主。然而在電漿放電區的上游處及下游處各有一區間的基材上能成長出富含CF2鍵結之奈米片狀結構，使表面具有超疏水及疏油特性，且其位置是對稱於中央放電區。

關鍵字

四氟甲烷 ； 八氟環丁烷 ； 超疏水 ； 微波電漿

並列摘要

In this study, tetrafluoromethane (CF4) and octafluorocyclobutane (C4F8) mixed gas plasma were used for surface coating to improve the hydrophobic and oleophobic properties of the substrate, and the plasma modification time, substrate placement position and height were discussed. The influence of parameters includes the type of substrate on the hydrophobic and oleophobic properties of the substrate surface. The WCA, SEM, XPS, FTIR and other instruments were used to analyze the changes of surface physical morphology and chemical composition, and the OES was used to analyze the changes of species concentration in the plasma.
At first, the glass substrate was surface-modified with microwave plasma, and it was found that the surface having a roughened surface after modification could make the surface super-hydrophobic. Finally, the copper substrate which is not easily etched by the fluorine-containing plasma is used for modification, and the modification characteristics of the respective positions in the entire reactor are discussed. The results show that the film formation phenomenon is roughly symmetrical and placed in the center. The copper sheet in the discharge region is intensely bombarded by ions, and the film formation rate is extremely slow, and the deposited film is mainly CC-bonded. However, for substrates placed upstream and downstream of the plasma discharge zone, a nano-wall-like structure rich in CF2 bonds can be grown on the substrate, so that the surface has superhydrophobic and oleophobic properties

並列關鍵字

CF4 ； C4F8 ； Super-hydrophobic ； Microwave plasma

參考文獻

[13] 鄭為允, 以高溫微波電漿火炬轉化四氟甲烷與六氟化硫之研究, 中原大學化學工程研究所學位論文, (2007) 1-93.

[1] S. Ebnesajjad, Fluoroplastics, Volume 1: Non-Melt Processible Fluoropolymers-The Definitive User's Guide and Data Book, Elsevier, 2014.

[2] D.C. Bromfield-Lee, M.T. Oliver-Hoyo, A qualitative organic analysis that exploits the senses of smell, touch, and sound, J. Chem. Educ, 84 (2007) 1976.

[3] P. Bayiati, A. Tserepi, P. Petrou, S. Kakabakos, K. Misiakos, E. Gogolides, Electrowetting on plasma-deposited fluorocarbon hydrophobic films for biofluid transport in microfluidics, Journal of applied physics, 101 (2007) 103306.

[4] 楊士賢, 以脈衝式電漿輔助化學氣相沉積法製備氟化非晶碳膜之研究. 中原大學化學工程研究所碩士論文, 2005.