This study addresses on the characteristics of Electrolyte-Insulator-Semiconductor (EIS), with stack membrane (3-aminopropyltriethoxysilane (APTES) / silicon dioxide) and nano structures, fabricated by nanoimprint lithography. The results of measurements such as contact angle, AFM and XPS shows the surface characteristics of stacked APTES/SiO2 is different from the conventional membrane (SiO2). According to the results of measurements, the EIS with stacked membrane and nano patterns shows better performance. Therefore, the device soak in the APTES solution about 90 minutes and with square nano structures (line/space = 200/400 nm) exhibit the better performance.