透過您的圖書館登入
IP:3.15.25.32
  • 學位論文

奈米級銀緩衝層對鎳/矽(111)及鈷/矽(111)磁性影響研究

Magnetic properties of Ni/Si(111) and Co/Si(111) with nanoscale Ag buffer layers

指導教授 : 蔡志申
若您是本文的作者,可授權文章由華藝線上圖書館中協助推廣。

摘要


本研究的主題為磁性物質以及表面合金,以歐傑電子能譜儀量測樣品的成分、以低能量電子繞射儀量測樣品結構以及表面磁光科爾效應儀量測磁特性。由於金屬/半導體近年來在科技上表現出卓越的潛力,矽又是其中最廣為使用的基板,並且矽化物在自旋電子元件等科技產品上也有不錯的應用,在過去的研究中亦發現銀緩衝層也是一個可以用來改變磁特性的主要材料之一,所以本篇論文的主軸放在矽化物的生成與應用中以及銀緩衝層影響磁特性的研究。如果將銀做為插入層,可以幫助鎳矽化物的形成;並且藉由銀的重構層我們發現鎳及鈷鍍在其表面時,會有不同的現象發生讓我們在製作元件上更有效的調控;最後銀做為緩衝層蓋在鎳表面時,藉由調控銀鎳介面的接觸面積可以來去控制其磁異向能。未來更希望可以研究更多種類的表面合金以及緩衝層,來發現其對磁性物質的磁特性如何造成影響,並希望可以使用同步輻射來更清楚的研究,成長樣品的表面形貌以及合金狀態,使得實驗成果能夠對於工業上有更大的貢獻。

關鍵字

none

並列摘要


Throughout my doctoral research, the main topic will be surrounded by magnetic surface alloys including two main kinds which are magnetic materials on surface alloy and surface alloys formed by magnetic material and semiconductor substrates. Combined with Auger electron spectroscopy (AES), surface magneto-optic Kerr effect (SMOKE), scanning tunneling microscopy (STM) and low-energy electron diffraction (LEED), the structure, composition and magnetic properties can clearly investigated. Because magnetic metal/silicide interface is claimed to have great potential on quantum computing, spintronic devices and nanoscale Ag buffer layer is commonly used to influence the magnetic properties of ferromagnetic materials, we focus on the some novel methods of producing magnetic surface alloys and the influence of Ag buffer layers on the magnetic properties of ultrathin magnetic thin films. Nowadays, Ni silicides show great potential on new functionalities. In this dissertation, we first explore the Ni/Si(111) system with Ag buffer layers. When Ni is deposited on Si(111), Ni silicides form at room temperature and the stoichiometrics of Ni silicide show the formation of NiSi compounds. The formation of Ag-Si particles provide a viable strategy for enhancing silicide formation via a specific interaction transfer mechanism even at room temperature, and provides insights into strategies for producing ultrathin silicides at a buried interface. Furthermore, in our previous reports, we find out that the silver reconstruction layer is a flat surface and influence the silicide formations. So we try to compare the effect of the reconstruction layer on Co and Ni ultrathin films, respectively. We propose a molecular-incident reaction effect (MoRE) to explain the phenomena after depositing Co and Ni on -Ag/Si(111). The comparable of crystalline energy with the space groups can be used to make sure that the species of the dominant formation type as CoSi2 and NiSi, respectively. Ag buffer can significantly influence the magnetic properties of magnetic ultrathin films because of the effective magnetic anisotropy change. After capping 1 ML Ag on top, we observe a slight and significant enhancement of coercive force for as-deposited and annealed series, respectively. A further enhancement of coercive force can be observed for both as-deposited and annealed series after annealing to above 450 K. This observation results from the interdiffusion of Ni atoms towards the upper Ag buffer layers to have larger contact area between Ni and Ag interfaces. Because my major is in the field of magnetic surface alloys and Ag buffer layers, the research results show great potential on the industrial applications. In the future, I would like to investigate different magnetic surface alloys and even surface alloys which can induce some ferromagnetic properties. Furthermore, I should find more buffer layers which can significantly influence the magnetic properties and may produce different magnetic properties in one sample after the interaction between buffer and magnetic layers. In order to find more direct evidence supporting our theoretical calculations, x-ray photoelectron spectroscopy mapping and synchrotron radiation can be utilized to investigate the surface morphology and compositions of our sample. Combined these fields of research, we can offer a more expansive range of applications on industry.

並列關鍵字

none

參考文獻


[1] J. Kim, S. Choi, T. Park, J. Kim, C. Kim, T. Cha, H. Lee, E. Lee, J. Y. Won, H. Lee, S. Hyun, S. Kim, D. Shin, Y. Kim, K. Kwon, and H. Kim, Chemically homogeneous and thermally robust Ni1-xPtxSi film formed under a non-equilibrium melting/quenching condition, ACS Appl. Mater. Interfaces, 2017, 9, 566–572.
[2] K. R. Jeon, B. C. Min, A. Spiesser, H. Saito, S. C. Shin, S. Yuasa and R. Jansen, Voltage tuning of thermal spin current in ferromagnetic tunnel contacts to semiconductors, Nature Mater.,2014 13, 360–366.
[3] T. Taniyama, E. Wada, M. Itoh and M. Yamaguchi, Electrical and optical spin injection in ferromagnet/semiconductor heterostructures, NPG Asia Mater., 2011, 3, 65–73.
[4] Y. C. Chou, W. Tang, C. J. Chiou, K. Chen, A. M. Minor and K. N. Tu, Effect of elastic strain fluctuation on atomic layer growth of epitaxial silicide in Si nanowires by point contact reactions, Nano Lett., 2015, 15, 4121–4128.
[5] J. A. Kittl, A. Lauwers, O. Chamirian, M. Van Dal, A. Akheyar, M. De Potter, R. Lindsay and K. Maex, Ni- and Co-based silicides for advanced CMOS applications, Microelectron. Eng., 2003, 70, 158.

延伸閱讀