利用受挫全反射方法激發表面電漿波對氯化汞之研究

本文主要是利用光學受挫式全反射法和稜鏡式的 Otto 組態與 Kretschmann 組態激發表面電漿波對氯化汞之研究。運用不同的金、銀、銅薄膜及待測物層厚度變化，進行電腦模擬激發表面電漿波 Otto 組態與 Kretschmann 組態找出產生表面電漿波共振角時，最佳化金、銀、銅薄膜及待測物層厚度。對整個模擬結果作深入分析與探討後，顯示氯化汞在 Otto 組態中使用金薄膜時待測物層厚度在 150(nm) 、銀薄膜時待測物層厚度在 300(nm)、銅薄膜時待測物層厚度在 150(nm)時，在Kretschmann組態中金薄膜厚度在45(nm)、銀薄膜厚度在53(nm)、銅薄膜厚度在37(nm)時所產生的表面電漿波具有最佳的電漿波共振角。

關鍵字

受挫式內部全反射；表面電漿波；氯化汞； Otto組態； Kretschmann組態

並列摘要

This paper mainly uses the optical frustrated total reflection method and the BK7 prism Otto configuration and Kretschmann configuration to excite the surface plasma wave to Mercury Chloride. Using the thickness and angle of incidence of different gold, silver, and copper films, computer simulations of the excited surface plasma wave Otto configuration and Kretschmann configuration to find the surface plasma wave resonance angle Optimize the thickness of gold, silver, copper and analyte layer films. After in-depth analysis and discussion of the entire simulation results, in the Otto configuration, when using gold metal, the analyte layer thickness is 150 (nm), when using silver metal, the analyte layer thickness is 300 (nm), when using copper metal, the analyte layer thickness is generated at 150 (nm). it is shown that the thickness of the gold film is 45 (nm) in the Kretschmann configuration, the silver film thickness is 53 (nm), and the copper film thickness is 37 (nm) The surface plasma wave has optimized plasma wave resonance angle.