類鑽碳與光觸媒薄膜動態乾摩擦時之接觸電阻變化研究

A study on the variations of electrical contact resistance for the DLC and TiO2 films under dry friction process

王瑞鴻(Ruei-Hong Wang)

指導教授 ： 周煥銘 ； 張育斌

崑山科技大學/工程學院/機械工程研究所/碩士(2007年)

https://doi.org/10.6828/KSU.2007.00046

摘要

本研究團隊過去已成功發展摩擦帶電機制成為動態監控金屬薄膜磨潤特性的新方法，並且發現不管是就靈敏性或判別性之考量，上述此種新方法均優於傳統以摩擦係數監控的方式，但卻因導電特性之限制而只侷限在導體對導體材料之配對。
因此，本研究係進一步在上述理論基礎上利用往復摩擦試驗機暨量測系統，動態同時量測摩擦界面之接觸電阻、摩擦係數及垂直變位振幅對應於滑動距離之連續變化，用以監控半導體或絕緣體薄膜破裂時機與磨耗顆粒或氧化物之生成對接觸電阻之影響，並量測磨耗損失量及以SEM觀察微奈米級材料轉移現象。
本研究可分為三大部分：第一，在乾摩擦狀態下使用接觸電阻來監控鈦之上試片分別與純鈦及純鈦鍍二氧化鈦薄膜之下試片於不同荷重下之磨耗行為；第二，以接觸電阻來監控鈦之上試片分別與純鈦及純鈦鍍二氧化鈦薄膜之下試片於不同滑動速度下之磨耗行為；第三，使用接觸電阻來監控純鈦鍍類鑽碳薄膜之下試片分別受到鐵及鈦之上試片摩擦時於不同荷重下之磨耗行為。以上這些動態監控半導體及類鑽薄膜摩擦界面磨耗行為的研究成果，將可提供產業界做為日後薄膜工程研究之依據。

關鍵字

類鑽碳薄膜 ； 光觸媒薄膜 ； 接觸電阻 ； 動態監控 ； 摩擦

並列摘要

The tribo-electrification mechanisms had been successfully applied to monitor the tribological properties between the metal films by our laboratory members. Moreover, the novel method of using continuous tribo-electrification variations for monitoring the tribological properties between the soft metal films is more “sensitive” and “discriminative” than that by the continuous friction coefficient variations as usual. However, the above novel method is only suitable for the conducted materials.
Therefore, this study is based on the above results to further develop another novel method for dynamic monitoring the tribological properties between the semiconductor or insulator films in the friction process. The experiment was conducted by the self-developed friction tester and its measure system. The dynamic electrical contact resistance, friction coefficient and vertical displacement were measured for monitoring the timings of film rupture or the oxide formations between the semiconductor or insulator films. Moreover, the wear loss was measured by an accuracy balance and the SEM was used to observe the structures of material transfer.
This paper can be discriminated the following three types: Firstly, a study of using continuous electrical contact resistance variations for monitoring the tribological properties of Ti/Ti and Ti/TiO2-film/Ti under different normal loads in dry friction process. Secondly, a study of using continuous electrical contact resistance variations for monitoring the tribological properties of Ti/Ti and Ti/TiO2-film/Ti under different sliding speeds in dry friction process. Thirdly, a study of using continuous electrical contact resistance variations for monitoring the tribological properties of Fe/DLC-film/Ti and Ti/ DLC-film/Ti under different normal loads in dry friction process. All of the above results can be applied to develop the film coating technology for the industry in the future.

並列關鍵字

Dynamic monitoring ； TiO2 film ； Electrical contact resistance ； Friction ； DLC film

參考文獻

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