直線式連續濺鍍製作氧化鋅共摻雜鎵鋁薄膜

Gallium and Aluminum Co-doped Zinc Oxide (GAZO) Films Prepared by in-line Sputter Tool

吳光榮(Kuang-Jung Wu)

指導教授 ： 張慎周

崑山科技大學/工程學院/電機工程研究所/碩士(2010年)

摘要

本研究採用直線式連續濺鍍製作氧化鋅共摻雜鎵鋁薄膜(GAZO)，連續式直流濺鍍方式也是目前業界最普遍使用來生產大面積、高產量的薄膜生產方式。

在沉積GAZO薄膜時，通入純氬氣並以6mm/sec移動速率下，藉由改變基板溫度為室溫、100℃、200℃、250℃條件下所製作的GAZO薄膜，最佳條件在基板溫度250℃下所沉積的GAZO薄膜平均光穿透率可達到91%(波長400-1100nm)及最低電阻率為4.43×10-4Ω-cm這比文獻中80%的光穿透率及8.17×10-4Ω-cm的電阻率優。

在相同製程氬氣及基板溫度200℃下以基板移動與基板靜止時濺鍍薄膜後的光、電各項性質的比較，結果不管是基板移動或基板靜止時薄膜在光穿透率方面並無很大差異都有高達90％以上，而在基板移動時薄膜的電阻率7.84×10-4Ω-cm比基板靜止時電阻率16.0×10-4Ω-cm好，這符合在做此實驗前的預期，因為基板移動濺鍍時受熱較均勻，因此獲得能量較多，導致薄膜缺陷較少。

希望藉由本研究可以提供如液晶顯示器、薄膜太陽能電池、觸控面板產業，在製作透明導電層的生產條件選擇參考。

關鍵字

氧化鋅共摻雜鎵鋁薄膜

並列摘要

substrate unheated temperature, 100 °C, 200 °C and 250 °C. In-line sputtering is a popular method to produce large area, high throughput thin films in today industry.
Optimum electrical and optical properties were obtained from GAZO films with 250 °C substrate temperature during sputtering: 91% average optical transmittance in 400~1100 nm region and 4.43×10-4Ω-cm electrical resistivity; better than 80% average optical transmittance and 8.17×10-4Ω-cm electrical resistivity corresponding to optimum GAZO films made by co-sputtering reported by others.
Whether the substrate moving condition: continuous moving or standstill with respect to target during sputtering can affect electrical and optical properties of in-line sputtered GAZO films or not was also studied. The electrical resistivity of GAZO films corresponding to continuous moving substrate is 7.84x10-4Ω-cm; which is almost one time lower than that corresponding to standstill substrate: 1.6X10-3Ω-cm. This could be related with better uniform heating on GAZO films corresponding to continuous moving substrate than those corresponding to standstill substrate.
This work can contribute to flat panel display, thin films solar cells, touch panel industries if GAZO films were considered as transparent electrode candidates.

並列關鍵字

Gallium and Aluminum Co-doped Zinc Oxide (GAZO) Films

參考文獻

[22] 林詩萍，"不同鍍膜溫度對透明導電鋅鎵氧化物薄膜之光電性質研究", 真空科技, Vol.19 No.2 (2006/11), 95-99

[40] 曾應欽，連續式濺鍍製作氧化鋅摻雜鋁薄膜，(碩論2008)

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