微電鍍製程和全像術干涉法製作D型光柵元件上之金屬薄膜

Micro-electroplating process and the production of holographic interferometry grating components on the D-shaped metal film

陳羿峰(Yi-Fong Chen)

指導教授 ： 何智廷

國立虎尾科技大學/工程學院/機械與機電工程研究所/碩士(2010年)

摘要

本研究提出利用全像術干涉技術先將繞射光柵設計製作於D型光纖上，利用濺鍍製程鍍上一層導電層之金屬薄膜方法。
再利用LIGA-like製程中的電鍍模造技術製作D型光纖金屬光柵，經過不同的製程，光柵深度將變淺。研究中以原子力顯微鏡(AFM)、掃描式電子顯微鏡(SEM)與光學量測等方法觀察與紀錄實驗之結果。
通過對實驗結果的分析,這種方法不僅可以獲得厚度理想的金屬保護層,同時可以提高光纖光柵的靈敏度。

關鍵字

光柵 ； 電鍍 ； 全像數干涉

並列摘要

This study is to proposes by using electroplating process technology and holographic diffraction gratings interference technology to design the grating structure on polymer material, and then sputtering process using a conductive layer to coat the metal thin film on the grating structure.
LIGA-like process was need by electroplating molding process to fabricate D-Shape fiber metal grating,, Through a different process, the grating depth of D-Shape fiber become shallow . Atomic force microscopy studies (AFM), scanning electron microscopy (SEM) and optical measurements were used to observe and record the results of experiments.
Through the analysis of experimental results, it show that this method not only can obtain the metal protective layer, also can increase the sensitivity of fiber grating.

並列關鍵字

grating ； electroplating ； holographic interference lithography

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