高分子反式脊狀光濾波元件之研製

Fabrication of Inverted-Ridge Polymeric Optical Filter

王子銘(Tzu Ming Wang)

指導教授 ： 莊為群

國立虎尾科技大學/電機資訊學院/光電與材料科技研究所/碩士(2010年)

摘要

本研究是以微影的製程及軟式模仁的製程技術，然後配合全像術干涉微影技術，來製造高分子反式脊狀光濾波元件。
製程中先以微影的製程來製作濾波元件，然後以這個光濾波元件再配合軟式印刷技術（non-photolithographic）的微接觸成形（micro-contact printing）、毛細管成技術（micromolding in capillaries）與複製成形技術（replica molding）來製作高分子波導元件模仁，再來利用前述的高分子波導元件模仁，配合各種不同折射率的高分子材料而來形成導光層，再來以黃光微影的負光阻製程，最後在配合光學全像術干涉微影技術，來製造高分子反式脊狀光濾波元件。
這種高分子反式脊狀光濾波元件，可大量生產，做法簡單製作容易，且很低的光損耗極低成本的特點。本研究中用掃描式電子顯微鏡、原子力顯微鏡（AFM）與光學的量測方法，實際觀測與紀錄的實驗結果，其光學傳輸特性可用光頻譜分析儀（OSA）來測量。

關鍵字

全像術干涉微影技術 ； 脊狀光濾波元件 ； 軟式模仁 ； 波導元件

並列摘要

In this thesis, we created a unique process combining with soft molding, photolithography and holography interference to fabricate a polymer Bragg reflection waveguide component.

First we made a waveguide component through photolithography and then combined with micro-contact printing of non-photolithography, micro-molding in capillaries and replica molding to fabricate the molding of the polymer waveguide component. Afterwards, we utilized formed polymer OG waveguide molding along with different diffraction rates of polymer materials to perform the optical transmission layer Finally, we used the process of thick layer photo-resist of photolithography associated with holography interference to implement a polymer Bragg reflective waveguide component.

The molding of this waveguide component is reproducible and is able used for mass production. It has some advantages including easy production, lowest optical loss and low cost.

The experiment results are measured and observed by AFM and SEM. Whereas the optical transmitting features are measured through the OSA.

並列關鍵字

holography ； Bragg ； soft molding ； waveguide component

參考文獻

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