奈米級光學對位與壓印系統控制

本文運用PID控制法則進行奈米級光學對位與壓印系統設備之系統整合與控制，此設備系統主要分為兩部分，一部分為奈米級光學對位系統，系統包含一組XXY高精度對位平台、一組三自由度(X、Y、θZ)雷射干涉儀迴授系統、一組上下模具CCD標記影像辨識系統，此系統用於壓印平台壓印時，即時監控壓印上下模具間相對位置(X-Y)與角度(θZ)誤差訊號；另一部分為壓印平台，其系統包含Z軸運動機構搭配光學尺訊號，進行Z軸壓印動作，在壓印過程可進行三段速度調整。系統控制是以PID控制器進行XXY對位平台控制及Z軸馬達控制，控制方法為兩段式控制補償，分別為速度模式進行長行程位移控制，位移速率5mm/s，控制精度分別為X軸2 um、Y軸2 um、θZ軸2 arc-sec、Z軸1 um，在精度達成上述定位精度時，系統自動切換至扭矩模式，進行奈米級定位補償控制，此時系統定位精度分別可達X軸70nm、Y軸50nm、θZ軸0.3 arc-sec。

關鍵字

PID控制；三自由度；單軸線性移動平台；光學量測；角度定位

並列摘要

This research concerns the development of a controller with optical alignment and Z-tilts error compensation for the nano-imprinting equipment. This nano-imprinting equipment comprises two important techniques: optical alignment system and imprinting stage. The optical alignment system which integrates the technologies of the XXY precision alignment stage, the 3-DOF laser interferometer measuring system and the CCD image recognition system of the mold mark allows to instantly compensate for positioning error(X-Y) and yaw error(θz) of dual-molds. The imprinting stage integrates Z-moving stage, 3-DOF Z-tilts compensating Piezo stage and Laser Displacement measuring system. The imprint operation can be completed with Z-moving stage and used linear scale to control position of Z-axis. The hybrid PID control with speed mode and torque mode is used to control the motion of the XXY precision alignment stage and the Z-moving stage. The speed mode control for long strobe position has been accomplished at constant speed of 5mm/s, the each position accuracy along the X- axis, Y- axis and Z- axis is 1um and the angular error along θz-axis is 1 arc-sec. The accuracy can be improved by using the torque mode control. The each result of the position accuracy along the X-axis, Y-axis and Z-axis is 50nm and the angular error along θz-axis is 0.5 arc-sec.

並列關鍵字

PID controller ； three-degrees-of-freedoms ； single-axis linear moving platform ； optical measurement Angle position

參考文獻

[2] Yongdae Kim, Byounguk Sohn, Woosub Youm, Jongkyu Jung,Jonghyun Lee,Kyihwan Park, (2008), Voice Coil Motor Nano Stage with an Eddy Current Damper, 10th Intl. Conf. on Control, Automation, Robotics and Vision Hanoi, Vietnam.

[3] Sebastian Polit, Jingyan Dong, (2011), Development of a High-Bandwidth XY Nanopositioning Stage for High-Rate Micro-Nanomanufacturing, IEEE/ Asme Transactions on Mechatronics, Vol.16, No.4, pp.724-733.

[4] Ge P. and M. Jouaneh, (1997), Generalized preisach model for hysteresisnonlinearity of piezoceramic actuators. Precision Engineering, 20, pp. 99-111.

[5] 李傑仁，2003年，具非對稱型磁滯系統控制及其於壓電驅動平台定位控制之應用，國立成功大學航空太空工程研究所碩士論文。

[8] Y. S. Kung and R. F. Fung, (2002), “Precision control of a piezoceramic actuator using neural networks,” IEEE conference on Control Application, pp. 1866-1871.

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奈米級光學對位與壓印系統控制

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