- 學位論文
以D型光纖為架構之光波元件之研製
Fabrication of Optical filter on D-type fibers
摘要
本論文提出以D型光纖為架構之光波元件之研製，結合黃光微影製程（Photolithography）與光學全像干涉微影(Holographic Interference Lithography）技術，製作出以D型光纖為架構之光波元件。 製作流程中，先以多模光纖特製研磨試片進行單邊研磨（Side-Polished）動作，精準的研磨拋光直到光纖纖芯為止。接著進行黃光微影製程與光學全像干涉微影技術，來製作繞射光柵濾波元件；使用旋轉塗佈正光阻方式，將短週期布拉格表面光柵曝光於光纖纖芯上，並以此繞射光柵濾波元件配合真空熱蒸鍍（Thermal Evaporation Coating ）製程技術，之後可觀察元件之光學反應及特性分析。 最後，研究過程中可完成製作出低損耗傳輸的全光纖式之D型光纖光柵濾波元件，其光柵週期與深度可以經由原子力顯微鏡（AFM）觀察，光學傳輸特性可由ASE 寬頻光源與光纖極化器利用光頻譜分析儀（OSA）等測量與紀錄實驗之結果，並且對研究進而探討。
並列摘要
This paper proposed the Fabrication of Optical filter on D-type fibers，Combination of Photolithography and Holographic Interference Lithography technology, In order to produce Fabrication of Optical filter on D-type fibers. During the fabrication, we first make some polishing samples to do side-polished on multi-mode fiber . It would Precisely stop polishing until reaching the core of fiber. Next we conduct to fabricate on diffraction grating filter component through photolithography process and holography interference lithography, and then it utilizes spinner to spin coating and expose the positive photoresist on core of fiber with short periodic Bragg surface grating . Moreover, the diffraction grating filter component along with thermal evaporation coating process to apply to Photoresist which was observed and analyzed its optical reactive features. At last, it can fabricate a low loss transmission whole fibered D-shaped optical fiber grating filter. Its period and depth of grating is observed by atomic force microscope ( AFM ) , and the results of optical transmission characteristics are measured and shown by ASE broadband light source and in -line optical fiber polarizer though optical spectrum analyzer (OSA).