DNA梳印和壓印製程研究與實作

Study and Implementation of DNA Combing and Imprinting Process

王建達(Chien-Ta Wang)

指導教授 ： 林依恩

國立虎尾科技大學/工程學院/機械與機電工程研究所/碩士(2011年)

https://doi.org/10.6827/NFU.2011.00030

摘要

DNA分子可藉由DNA梳印技術在具有微特徵結構的固體表面上拉伸成規則排列之DNA奈米線陣列圖案，然而其過程無法由實驗獲得完整的解析。本研究同時採用comsol軟體作數值模擬，以兩相流配合移動網格的方式來探討流體梳印過程。透過解析微米尺度的流場變化，可清楚了解實驗中整體DNA分子如何受到拉伸、固定以至圖案成形的經過。為了使具有微米柱陣列結構之印模上成形奈米線圖案部分，當印模在DNA溶液中向上提起時，利用表面張力來產生奈米線圖案，發現DNA會在相鄰柱中間沿著梳印方向被拉伸形成直線型DNA奈米線，再透過模擬證明原本盤繞態之DNA分子於兩柱中間開始產生拉伸及固定的動作，並於模擬分析DNA梳印過程受柱幾何旋轉角度影改變下響。
本研究利用微機電製程製作出具有微米柱陣列結構之印模，在利用DNA梳印技術使印模之微米柱陣列結構形成奈米線後，在經過鍍金、氣相沉積及光壓印等製程來完成基因晶片所需之微奈米流道。

關鍵字

關鍵字 ； comsol ； 分子梳印 ； DNA奈米線

並列摘要

DNA molecules can be printed by DNA technology in the comb structure with micro-features on the surface of the solid stretch of DNA into a regular arrangement pattern of nanowire arrays, but the process can not be complete by the experimental resolution. In this study, while using comsol software for numerical simulation to two-phase flow with moving grid approach to the process of printing fluid comb. Through micron-scale resolution of the flow field changes, the whole experiment can be a clear understanding of how DNA molecules are stretched, fixed as well as patterns formed through. In order to have the impression micron pillar array structure formed on the pattern part of the nanowire, when an impression in the lift when the DNA solution, using surface tension to produce nanowire patterns, DNA will be found along the comb in the middle of the adjacent column print direction is stretched to form linear DNA nanowires, and then through simulation to prove the original coiled state of DNA molecules in the middle of two columns begin to stretch and fixed movements, and in the process of simulation analysis of DNA comb Indian film by rotation of column geometry change under the ring.
In this study, micro-electromechanical manufacturing process to produce a micron pillar array structure of the impression, printed in the use of DNA technology to comb impression of micron pillar array structure after the formation of nanowires, after plating, vapor deposition processes such as stamping and light required to complete the gene chip micro-nano-flow.

並列關鍵字

Keywords ； comsol ； mechanism of stretching ； DNA nanowires

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