精巧型雷射直寫系統及繞射元件之研製

A Study and Fabrication of an Exquisite Laser-Directly-Writing System for Diffractive Devices

王仁椲(Jen-Wei Wang)

國立虎尾科技大學/電機資訊學院/光電與材料科技研究所/碩士(2005年)

摘要

本文的目標在研製一套製作繞射光學元件的設備與方法。為了達成此一目標，首先，本論文以共軛焦的觀念研發雷射直寫系統，可直接將繞射圖案刻在基版上。由於此一階段的重點在發展工具與製程，因此本文採用光碟片的概念製造寫入的介質(基版)，以改變折射率或穿透率的方法完成二元(binary)繞射元件的製作。
為了完成雷射直寫的設備，本研究結合了精密移動/定位、表面量測、傾角測量等技術，使系統有足夠的製造精度。此外，本論文詳細討論了雷射功率與光點大小對於寫入基版的影響，並完整探討此一系統的原理、結構、特性、測量能力與製造精度。在設計方面，我們除了探討繞射光學的理論及繞射光學元件的規格外，並利用自製的雷射直寫系統完成一系列的繞射光學元件；在進行比對量測後，驗證了系統的寫入與測量能力，達到論文所設定的目標。

並列摘要

The aim of the thesis is to study and to fabricate a set of apparatus and method for diffractive optical devices. To achieve this object, we first study and develop a laser-directly-writing system based on the conjugate-focus concept so that a diffraction pattern can be written directly on a substrate. Since the point of emphasis is to develop a tool and process, thus the concept of fabricating a CD/DVD written medium (or substrate) is used to change the reflectivity or the transmittance of the medium, and, therefore, the fabrication of a binary diffractive device is accomplished.
For implementing the laser-directly-writing apparatus, this research incorporates the precision displacement/position, the surface measurement, and the incline measurement technologies so that this system will have enough fabrication precision. In addition, in this thesis the effects of the laser power and the dimension of the laser spot on the writing on the substrate are discussed in detail. An integrate study of the system’s principle, structure, properties, measurement ability, and fabrication precision is also accomplished. In the design respect, except the study of the optical principle of diffraction and the specification of the diffractive devices, we also finish a series of diffractive devices using a self-made laser-directly-writing system. After a comparison of measurements, the writing and measurement capabilities of the system have be verified that the desired object of this thesis has been achieved.

參考文獻

[8] Ernst-Bernhard Kley, ”Continuous profile writing by electron and optical lithography”, Microelectronic Engineering, vol.34 p261-298, 1997

[9] Walter Daschner, Pin Long, Michael Larsson, et al., “Fabrication of diffractive optical elements using a single optical exposure with a gray level mask”, J. Vac. Sci. Technol. B13(6), p2729-2731, 1995

[10] Canyon Materials Inc. Product information and guide

[11] Th.Dresel, J.Schwider, “Fabrication of optical components by laser lithography”, Applied Surface Science, vol.106, p379-382, 1996

[13] 陳有田，“光碟聚焦的伺服控制研究與分析”，元智大學電機工程研究所光電組，碩士論文，中華民國91年