本論文主要是對軟性電子基板表面以氧電漿(oxygen plasma)處理方 式進行改質,以提高基板表面和鍍膜間之附著力。基板材質選用環烯烴 聚合物(Cyclic olefin copolymer, COC)。基板表面經不同電漿功率及不同 改質時間處理後的元素成份及化學鍵結變化,可由電子能譜儀(X-ray Photoelectron Spectrometer;XPS)分析。我們發現隨著電漿處理時間及功 率的增強,氧原子含量會有增加的趨勢。而藉由對電子能譜之C1s 及O1s 進行圖譜分峰發現基板表面確實導入了C-O 及C=O 親水性官能基。表 面能的提高及官能基的形成,是增強基板和鍍膜附著力的主要因素。
The surface of flexible electronic substrate was modified by oxygen plasma treatment. COC (cyclic olefin copolymer) was used to be the substrate in this study. The atomic components and chemical structure of the COC substrates modified by different plasma powers and times were examined by XPS (X-ray Photoelectron Spectrometer). The oxygen ratio of modified surface was depended on the plasma power and modified times. After peak fitting the C1s and O1s of XPS spectra, the C-O, C=O hydrophilic functional groups were created on the surface of COC substrate. The interface adhesion between COC substrate and coating layers was enhanced primarily due to the hydrophilic functional groups formation and surface free energy increasing.