以濺鍍法製備氧化銦鋅透明導電膜及其特性研究

Fabrication and characterization ofIndium-Zinc oxide thin films by sputtering.

黃崇傑(Chung-Chieh Huang)

國立虎尾科技大學/電機資訊學院/光電與材料科技研究所/碩士(2007年)

摘要

中 文 摘 要
TCO透明導電薄膜在光電產業上的應用相當廣泛，可使用於太陽能電池(solar cells)、平面顯示器(flat panel display，FPD)、觸鍵式面板(touch panel)等器材上；但目前透明導電薄膜主要用途，還是被使用作為平面顯示器之透明導電電極。透明導電薄膜的材料，主要是採用在可見光範圍有較高的穿透率的之氧化物半導體，如ITO (tin-doped indium oxide)、IZO(indium zinc oxide)等。目前工業上使用之透明導電薄膜材料為ITO，但在已知透明導電薄膜材料中，銦鋅氧化物-IZO-薄膜，為極具潛力之ITO薄膜的替代材料。和ITO薄膜相較之下，IZO薄膜在低溫下即可被鍍製成穩定的透明導電薄膜，此一特性不論在製備及蝕刻處理上都比ITO薄膜有優勢。
本研究之目的即在探討利用磁控濺鍍的方式來製作IZO薄膜，在不同的參數下，觀察薄膜的光電特性。實驗結果顯示，在室溫下，用DC 功率 100 W沈積IZO薄膜，其電阻率可達到< 6E-4Ω-cm，而其穿透度可高於90 %以上，這樣優越的特性，使得IZO不管是應用在無機或是有機的LED電極製作上面都具有相當大的競爭力。此外，由於在室溫的環境中就可以製作出低電阻值高穿透鍍的IZO薄膜，因此，利用這樣的技術，我們也在塑膠基板上試作了以IZO為電極材料的PLED元件。

並列摘要

Abstract
TCO (transparent conductive oxide) is widely used in the optoelectronics, such as solar cells, flat panel display (FPD), and touch panel due to their high visible light transmission and great electrical conductivity. The main purpose of TCO is usually employed as the transparent electrode. These kinds of materials include indium tin oxides (ITO), indium zinc oxides (IZO), and etc. Currently, ITO is the material which is widely used in the industry. However, IZO thin films have great potentials to replace ITO thin films due to it can be deposited at lower temperature while maintaining high visible light transmittance and high electrical conductivity. This low temperature processing capability allows IZO thin films to be applied in many fields, especially the flexible substrate. The experiment result shows that the IZO thin film which was deposited at room temperature with DC power 100 W has the superior property. The film shows the low resistivity of 6E-4 Ω-cm, and high transmission of 90 %. Using the low temperature sputtering process, IZO thin film will be employed for the PLED electrode and deposited on flexible substrate.

參考文獻

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