以PECVD製程製備SiNxHy與SiO2探討在不同生醫基材的機械性質之研究.

氮化矽和二氧化矽薄膜常用電漿輔助化學氣相沉積（PECVD）技術來製備。這兩種薄膜密度高，化學性呈惰性，並且通常用於積體電路中的鈍化和矽元件的局部氧化層。不同的PECVD技術，在不同條件下會影響的薄膜的性能，本研究中討論鍍膜在不同基材上之機械性能，以及找出薄膜在退火條件下的性能變化所帶來的影響，氮化矽（SiNxHy）和二氧化矽（SiO2）薄膜透過PECVD儀器製備在三種基板上，分別為矽晶片（Si），鈦鋁合金（Ti6Al4V ELI）和不銹鋼（316 LVM）。並探討SiNxHy和SiO2薄膜在很短的時間（5分鐘）下進行在500 ℃的熱退火影響。磨耗實驗則模擬一個人在進行跑步時膝關節的接觸與運動條件，試片母材是Ti6Al4VELI和316LVM不銹鋼，並在其上通過PECVD製備SiNxHy作為保護膜，膜厚度約1000nm下。並自行開發設計磨耗實驗機，上試片可逆時鐘旋轉而下試片是一個可進行往復6毫米的直線運動，下試片並施加一垂直振動，以模擬行走時所引起的振動，這是一個約2赫茲的頻率振動。由兩個扭力計測量旋轉和滑動方向的摩擦力。從磨耗實驗的結果來看，這兩個薄膜的摩擦係數大於未處理的基材。試片條件為氮化矽薄膜在Ti6Al4VELI與其他條件下比較，在小牛血清潤滑下磨損量為最少。本研究利用PECVD所鍍製的薄膜在X光繞射法(XRD)檢驗其結晶結構，呈現沒有結構型的狀態，因此導致鍍膜後的黏附力不佳。如能提高SiNxHy薄膜在Ti6Al4V ELI之附著力，可以擴大其應用於人工關節上。

關鍵字

PECVD ； SiNxHy ； SiO2 ；機械性質；磨損；摩擦

並列摘要

Silicon nitride and Silicon dioxide layers are most commonly deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Such thin films are dense, chemically inert, and are typically used for passivity in integrated circuit technology and for local oxidation of silicon. Various PECVD techniques are carried out at difference conditions which affect the properties of films. Mechanical properties of coating films on difference substrates are discussed in order find out the affect of annealing conditions on properties of thin films in this research. Silicon nitride (SiNxHy) and silicon dioxide (SiO2) were prepared by PECVD instrument on three kinds of substrates: silicon wafer (Si), titanium alloy (Ti6Al4V) and stainless steel (316 LVM). The aim of this work is to investigate the influence of thermal annealing at 500 oC on a short time (5 minutes) on the properties of SiNxHy and SiO2 thin films. Contacting and kinematic conditions of a knee joint when a person in running was simulated. Substrates of specimens are Ti6Al4VELI and 316LVM stainless steel. The silicon nitride film, SiNxHy prepared by PECVD, was used as a protect film, and it’s thickness is about 1000 nm under the polymer film. The test device was developed, upper specimen is rotated reversely and the lower one is moved linearly forward and backward for 6 mm. A frequency vibration is applied under the lower specimen to simulate the vibration caused from walking, which is sated 2 Hz. Two torque meters were used for friction measurement in rotational and sliding directions. Experiments simulated vertical vibration, rotary and reciprocating motion. Wear results show that friction coefficient of these two films are greater than untreated substrates. But wear loss weight Ti6Al4VELI with SiNxHy film lubricant in Bovine serium is effectively decreased than the other case. XRD results show that all coating films prepared by PECVD are amorphous phase. So the adhesive ability is not good. By improving adhesion of SiNxHy on Ti6Al4VELI can extend its application on artificial joint.

並列關鍵字

PECVD ； SiNxHy ； SiO2 ； mechanical property ； wear ； friction

參考文獻

[1] Carlson, O. N. (1990), The N-Si (Nitrogen-Silicon) System, J. Phase Equilibria 11(6): 569–573. doi:10.1007/BF02841719.

[2] Katsutoshi Komeya, Yohtaro Matsuo and Takashi Goto , Seeds Innovation and bearing applications of silicon nitride ceramics, doi:10.4028.

[9] Silicon dioxide, 11 Apr. 2003.

[11] P. Martins, C. Malhaire, S. Brida, and D. Barbier, On the Determination of Poisson's Ratio of Stresses Monolayer and Bilayer Submicron Thick Films, DTIP of MEMS and MOEMS (ISBN-978-2-35500-006-5), 2008.

[12] J. M. Grow and R. A. Levy, Micromechanical characterization of chemically vapor deposited ceramic films, Journal of Materials Research, vol. 9, pp. 2072-2078, 1994.

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以PECVD製程製備SiNxHy與SiO2探討在不同生醫基材的機械性質之研究.

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