Titanium dioxide thin film was deposited on a p-type silicon substrate using RF magnetron sputtering. Ratio of argon to oxygen, ratio of argon to nitrogen, and annealing temperature were investigated to obtain the optimal photocatalytic reaction. Titanium dioxide nanorods prepared by chemical hydrothermal method. Effects of PH value and growth time on structure of nanorods and photocatalytic reaction were studied. Crystal structure, morphology and properties of crystalline photoluminescence of titanium dioxide thin film with nanorods were examined using X-ray diffraction, field emission scanning electron microscopy, and optical excitation fluorescence spectrometer. Photocatalysis of titanium dioxide thin film with nanorods was analyzed using a methylene blue solution.