- 學位論文
應用於壓印設備之奈米級對位系統開發
Development of a Nano-Positioning alignment stage for the nano imprint device
摘要
中文摘要 本論文提出一種應用於奈米轉印設備上的三自由度奈米級對位系統，完成其設計、組裝、校正、控制、精度量測及整合，並使用雙光柵干涉式對位量測系統作為其回授系統。此奈米級對位平台主要由兩個部份組成，第一個部份為三自由度步進馬達定位平台，第二個部份為二自由度壓電補償平台。三自由度步進馬達定位平台是利用三組互相獨立並依順時針排列的步進馬達驅動精密導螺桿進而帶動VR導軌完成三自由度動作，但是其Ｘ、Ｙ方向對位控制很難突破至奈米級精度，因此需利用二自由度壓電補償平台對三自由度步進馬達定位平台移動時所產生的X、Y 方向直線度誤差進行補償，使整個系統的對位精度達到奈米級。此奈米級對位平台之回授系統是利用穩頻偏極雷射與光學鏡組所架構成的雙光柵干涉式光學對位量測系統。奈米級對位平台經由閉迴路控制器，可使X軸與Y 軸之單軸對位精度達±10nm， 軸對位精度達±1arcsec。
並列摘要
Abstract This paper presents the design, analysis, assembly, calibration and measurement of a 3-DOF nano-positioning alignment system for the nano imprint device with dual-grating interferometer alignment system as feedback. This 3-DOF nano-positioning alignment stage integrates two major stages, one is 3-DOF stepping motor alignment stage, the other is 2-DOF piezoelectric nano stage. The 3-DOF stepping motor alignment stage which is formed the ‘U’shape from three independent stepping motor, and 3 stepping motor drives 3 precision ball screw to push the VR guide rail, but the stage can’t be controlled at high accuracy because of the stepping motor. Thus, the 2-DOF piezoelectric nano stage by using piezoelectric actuator is designed to compensate X axis and Y axis’s horizontal straightness in order to achieve the positioning control at nano-accuracy. The feedback of 3-DOF nano-positioning alignment stage is dual grating interferometer alignment system which composed of one He-Ne laser, two optical module, one transmission grating and one reflection grating. The X-axis and Y-axis position accuracy of the PZT stage is ±10nm by using the close loop control.