使用多次模仁翻印法之奈米壓印製程實現導模共振光學濾波器

本論文提出利用多次模仁翻印之奈米壓印技術來降低導模共振元件的調制深度，實現窄頻的光學濾波器。首先使用聚二甲基矽氧烷(PDMS)與市售光柵母模製作PDMS模仁(PDMS-1)，然後利用該PDMS模仁使用奈米壓印技術將光硬化材料之光柵結構壓印在聚甲基丙烯酸甲酯(壓克力)基板上，製作出UV膠光柵元件，將該光柵元件做為母模，再次製作PDMS模仁(PDMS-2)，因PDMS的固化收縮性，PDMS模仁(PDMS-2)的光柵調製深度會低於PDMS模仁(PDMS-1)的光柵調製深度，將其應用在奈米壓印技術製作成導膜共振濾波器時可以使線寬變窄。實驗上我們使用兩種不同之光硬化材料，GN969-62(UV子膠)與GP073-10-2(UV母膠)，市售光柵母模之光柵調製深度為140 nm，以該母模翻模出之PDMS模仁(PDMS-1)的光柵調製深度為122 nm，利用該PDMS模仁使用奈米壓印技術將兩種不同型號之UV膠壓印在壓克力基板上，以UV子膠壓印出的光柵調製深度為83 nm，以UV母膠壓印出的光柵調製深度為140 nm，並分別將此兩個UV膠光柵元件作為模具，翻模出兩種不同光柵調製深度的PDMS模仁，PDMS模仁的光柵調製深度分別為37 nm與85 nm，並且可以重複使用此方法使光柵調製深度更淺，因PDMS固化收縮率非常穩定，因此具有良好的重現性。使用此方法所做出之導膜共振元件其光柵調製深度可從75 nm降低到18 nm，共振角半高寬最窄達0.85度，共振波長半高寬最窄達2.3 nm。

關鍵字

導模共振；奈米壓印；光學濾波器

並列摘要

This study proposed a method to reduce the grating modulation depth of a guided mode resonance element by using multiple mold replica method in nanoimprinting process in order to achieve narrow band optical filters. Firstly, we use commercial grating mold to replicate grating structure on polydimethylsiloxane(PDMS) mold(PDMS-1). Then, the nanoimprint technology was used to replicate the grating structure of UV curing material on an acryl substrate to produce an UV grating element. We used the UV grating element as grating mold to replicate grating structure on another PDMS mold(PDMS-2). Because of the solidification shrinking of PDMS, the grating modulation depth of the second PDMS mold(PDMS-2) is lower than the first PDMS mold(PDMS-1). By this method, we can reduce the grating modulation depth of the optical guided mode resonance filter and its line width becomes narrower. We used two kinds of UV curing glue in nanoimprinting process, GN969-62(S-UV glue) and GP073-10-2(M-UV glue). The grating modulation depth of commercial grating mold is about 140 nm, the modulation depth of PDMS mold(PDMS-1) replicated by the commercial grating mold is 122 nm. We also used two kinds of UV curing glue, S-UV glue and M-UV glue, to fabricate grating by using the PDMS-1 mold. Their grating modulation depths were 83 nm and 140 nm, respectively. Then two PDMS molds were replicated from these two UV grating elements, and their grating modulation depths became 37 nm and 85 nm, respectively. The grating modulation depth of PDMS mold can be reduced by repeating this process. We find that this process has good reproducibility. The experimental results show that the grating modulation depth of guided mode resonance element can be reduced from 75 nm to 18 nm, and the smallest resonant angle of full width at half maximum(FWHM) could reach to 0.85˚, and the resonant wavelength of FWHM could reach to 2.3 nm.

並列關鍵字

guided-mode resonance(GMR) ； nanoimprinting ； optical filter

參考文獻

[10] 周柏仰, “波導共振模態濾波器的製作與模擬”, 國立交通大學電子工程學系電子研究所碩士班碩士論文 (2010).

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國際替代計量

使用多次模仁翻印法之奈米壓印製程實現導模共振光學濾波器

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