奈米級薄膜成長特性研究

摘要本文主要是研究物理沉積製程中，沉積後對薄膜量測其表面形貎及表面粗糙度的影響。在實驗方面我們以鋁為材料，針對物理沉積的各個參數:例如基板的溫度，鍍膜的時間，製程的功率，來做為各個參數的基準值來探討。再搭配模擬來呈現因不同的參數所造成不相同的狀態及對表面形貎及粗糙度所造成的影響。研究發現，在我們所運用的這些條件下，所得到沉積後的表面狀態，量測所測得數據分析出的粗糙度數值與文獻上的資料相當，這證實了本文在物理沉積實驗及薄膜表面的量測數值有相當的正確性。以製程上對於參數跟粗糙度二者的共同性，發現溫度是所有參數中佔有很重要的因素，在溫度與表面粗糙度中一直保持著同向的變化，致於其它參數的影響，發現有所出入，主要是參數在實驗中，加於其設定的不同，參數跟參數之間互相影響的結果。

關鍵字

分子動力學；原子力顯微鏡；物理沉積；表面粗糙

並列摘要

Abstract This study is mainly about the physical vapor deposition (PVD) in the system regulation. After depositing, we want to know the influence of its face shape to the thin film and the surface roughness. In the experimental aspect, we take the aluminum as the material to view of each parameter of physical deposition, for example; the temperature of substrate, the sputter time and the power of regulation process, could be the datum value of each parameter. We match molecular dynamics to present that the different parameters could cause the different condition and the influence to its face shape and the surface roughness. Under these conditions, we discover that the situation of surface after depositing, the roughness value is almost the same with the previous scientific literature. It confirmed that the tests of the physical deposition have the suitable accuracy with the thin film surface. By the system regulation in regarding the common traits between the parameter and roughness, the temperature holds the very important factor in all parameters. It has been maintaining the concurrent change between the temperature and the surface roughness. As for other parameter influence, it has the discrepancy, which is because the parameter in the experiment adds in its hypothesis difference and parameter themselves could influence with each other.