非對稱耦合器光柵波導元件之研究

A study of asymmetric Bragg coupled device with polymer waveguides

林其興(Chi-Hsing Lin)

指導教授 ： 莊為群

國立虎尾科技大學/電機資訊學院/光電與材料科技研究所/碩士(2008年)

摘要

本研究提出結合全像干涉微影技術及軟式模仁的新穎製程技術，並配合黃光微影製程光學技術，來製作非對稱耦合器光柵波導元件。
本製程中先以光學全像干涉微影技術，來製作高分子布拉格光柵元件，並以此光柵元件配合軟式印刷(soft printing)技術之微接觸成形(micro-contact printing)、毛細管成形(micromolding in capillaries)技術與複製成形(replica molding)技術來製作高分子光柵元件模仁，之後利用前述之高分子OG光柵元件模仁，以黃光微影製程之厚膜光阻製作出非對稱耦合器光柵波導元件。
本實驗會以不同轉速來控制波導的厚度,藉此來比較各波導厚度的效率。
此高分子光柵元件翻膜模仁可達到大量生產的效果，且此法具有製作容易、和低成本之優點。
研究中以原子力顯微鏡(AFM)、掃描式電子顯微鏡(SEM)與光學量測等方法觀察與紀錄實驗之結果，並研究探討。其光學傳輸特性可由光波量測系統測量得知。

關鍵字

軟式印刷 ； 微接觸成形 ； 毛細管成形 ； 複製成形

並列摘要

In this research, we propose a novel technique of fabricating an asymmetric Bragg coupler device by using holographic technique and master molding of soft printing along with the photolithography.
First, we produce out a polymeric Bragg Grating by Holographic lithography and then carried out a master mold of a Bragg Grating associated with techniques of micro-contact printing, micro-molding in capillaries and replica molding. While successfully fabricated a master mold of polymeric Grating component, we fabricated an asymmetrical waveguide coupler on the grating using photolithography with thick film photoresist.
In this experiment, the waveguides thickness were controlled by different spinning speeds thereby, a comparison of efficiency was made in each waveguide.
It is easily to achieve the mass production, easy fabrication and low cost by using technique of lift molding of polymeric Grating.
In order to observe and record the results of this experiment accurately, we utilize the AFM (Atomic Force Microscopy) and SEM (Scanning Electron Microscopy), and its characteristic of optical transmission can be observed by an optical measuring system.

並列關鍵字

soft printing ； micro-contact printing ； micromolding in capillaries ； replica molding

參考文獻

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