透過您的圖書館登入
IP:18.221.239.148
  • 學位論文

電解水產生氫氧燄火炬應用於分解半導體製程尾氣之探討

A Study of Electrolysis of Water to Produce Hydrogen Flame Torch Applied to the Decomposition of the Tail Gas of Semiconductor Manufacturing Process

指導教授 : 陳文瑞
若您是本文的作者,可授權文章由華藝線上圖書館中協助推廣。

摘要


本論文研製之電解水產生氫氧燄火炬應用於分解半導體製程尾氣之探討 由於臭氧層破洞及溫室效應等環保議題,半導體是台灣經濟發展的重要指標。而產業背後所隱藏的工業污染問題也日益受到重視。 半導體製造過程中會使用大量的特殊氣體(Specialty Gas)。而這些氣體具可燃性、腐蝕性、強氧化性或毒性,必須妥善處理。製程中也廣泛使用到全氟化合物(PFCs),這些PFCs氣體會影響人體血液帶氧功能,且其F-C、F-S及F-N之分子鍵具有相當高的紅外光吸收能力,為高溫室效應氣體。PFCs氣體全球溫暖化潛勢(GWP)達數千至數萬,因此有愈來愈多國際組織管制PFCs氣體的排放,及制定溫室效應氣體的減量計畫。 (PFCs為通稱,包括NF3、SF6、CF4、C2F6、C3F8、C4F8 及CHF3等) 目前處理PFCs氣體較為成熟的技術為燃燒法。目前多是燃燒瓦斯(天然氣,甲烷)產生火焰以去除PFCs氣體,然而瓦斯燃燒後仍會產出二氧化碳(CO2),二氧化碳也屬於溫室效應氣體之一。瓦斯為不安定的可燃性氣體,在瓦斯供應相關設備與管路建置成本及衍生的廠房保險等管理費用也相當高,因此利用瓦斯的燃燒法還是有改善的空間。 本研究之目的,即在探尋一種減少溫室氣體產生的燃燒式有害氣體處理裝置。使用電解水方式產生氫氣,供電即停止電解作用,沒有氣體蓄積的問題,提昇安全性,並用氫氧焰的高溫來破壞去除有害氣體。以CF4為代表性氣體,藉運用Fourier轉換紅外光譜(Fourier transform infrared spectroscopy, FTIR )量測處理前後濃度。並變化燃燒器設計,氣體流道變化,電解機功率,探討對分解去除效率(Decomposition and Removal Efficiency, DRE),及能源效益的影響。

關鍵字

溫室效應 四氟化碳

並列摘要


A procedure is A Study of Electrolysis of Water to Produce Hydrogen Flame Torch Applied to the Decomposition of the Tail Gas of Semiconductor Manufacturing Process Since the global warming problem and other environmental issues. The industrial pollution problems hidden behind Taiwan Semiconductor industry , an important indicator of economic development, are more attention. Semiconductor manufacturing process using a lot of specialty gases. These gases are flammable, corrosive, strong oxidizing or toxic and must be handled properly. The manufacturing process is also widely using perfluorinated compounds (PFCs), these PFCs gases will affect human blood carry oxygen function, and its F-C, F-S and F-N molecular bonds have high infrared light absorption capability. The global warming potential (GWP) of PFC Gases are thousands to tens of thousands, so there are more international organizations control PFCs gas emissions, and the development of greenhouse gases reduction plan. (PFCs including NF3、SF6、CF4、C2F6、C3F8、C4F8 、CHF3..) Currently, combustion method is more mature technology to decompose PFCs gas. At present, natural gas (methane) is using as fuel to remove PFCs, but after gas combustion still generate carbon dioxide (CO2), one of the greenhouse gases . Methane is a flammable unstable gas ,related supply equipment and piping need high initial costs and management fees , such as insurance .So combustion method still has room for improvement. The purpose of this study, is searching for a way to reduce greenhouse gases produced about harmful gas treatment unit. Using electrolysis of water to produce hydrogen, electricity stops electrolysis, no gas accumulation causing safety problem, and high-temperature hydrogen flame to destroy and removal harmful gases. CF4 gas be chose as a representative, by using Fourier transform infrared spectroscopy (Fourier transform infrared spectroscopy, FTIR) measurements Inlet and Exhaust concentration of treatment unit. And changes in burner design, gas flow path and power of electrolysis machine , investigate the Decomposition and Removal Efficiency (DRE), and the impact of energy efficiency.

參考文獻


[1]. 張國基、陳俊瑜,“高科技產業製程本質較安全設計與應用之研究” ,工業安全科技季刊63期,2007年9月。
[5] Chuen-Jinn Tsai, Chia-Hung Lin, Yu-Min Wang, Cheng-Hsiung Hunag, Shou-Nan Li, Zong-Xue Wu & Feng-Cai Wang, “An Efficient Venturi Scrubber System to Remove Submicron Particles in Exhaust Gas”, Journal of the Air & Waste Management Association, 55, pp. 319-325, (2005).
[6] Chang, M. B., Lee, H. M., “Abatement of Perfluorocarbons with Combined Plasma Catalysis in Atmospheric-Pressure Environment”, Catalysis Today, Vol. 89, pp.109–115 (2004).
[9] Tsai, C. H., Kuo, Z. Z., “Effects of Additives on the Selectivity of Byproducts and Dry removal of Fluorine for Abating Tetrafluoromethane in a Discharge Reactor”, Journal of Hazardous Materials, Vol. 161, pp.1478–1483 (2009).
[10] Mike Sherer, “Wafer fab exhaust management strategies”, Proceedings of the 2006 IEEE International Symposium on Electronics and the Environment.

延伸閱讀