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  • 學位論文

振動蒸鍍對薄膜品質之研究

Study of the Film Quality by the Vibrational Evaporation

指導教授 : 陳文瑞
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摘要


本研究以真空熱蒸鍍法制備金屬薄膜,探討在蒸鍍過程中增加表面振動於基板上,聲波造成的表面振盪,對於玻璃表面影響,並探討表面振動對於熱蒸鍍製程當中是否可改善其薄膜製程品質,並以表面輪廓儀…等方式證明增加表面振動對薄膜品質的粗糙度及膜後均勻性具有影響性,以玻璃基板50×50×0.5mm及100×100×0.5mm,在表面施予表面振動,分析在不同時間下增加表面振動其均勻度及粗糙值接有效的改善,平均差異值約10nm,而在色差實驗當中,根據哈佛大學的實驗當中得知,在不同的材料上其反射光依材料的不同而產生顏色差異,在實驗中將鍺材料蒸鍍在金鈹基板上,當厚度達到10nm以上時,顏色開始產生差異由橘到藍色,而由顏色對比差異證明其表面振動可達到膜厚均勻性及粗糙值降低的情形,而在擺放時間經過一週後發現表面顏色改變,其推測表面鍺薄膜應受到表面應力或氧化所造成,並探討針對不同的鍍膜參數的材料進行紅外線熱像量測,比較其高放射率遠紅外線材料其薄膜鍍對其放射遠紅外線量影響,經由這些實驗可幫助我們了解其薄膜厚度及基板表面處理差異對高放射率遠紅外線放射量之影響,而其實驗未來將可應用在相關感測、自動檢測機台、隱藏碼、真偽辨識、有效期限…等,可減少投射額外的光源。

並列摘要


In this paper, the metal thin films were prepared by vacuum thermal evaporation method, and the surface vibration caused by the surface vibration on the substrate and the sound waves was investigated during the deposition process. And to explore whether the surface vibration can improve the quality of the film process in the thermal evaporation process and demonstrate that the surface vibration has an influence on the roughness of the film and the uniformity of the film after the surface profilometer. The surface vibration was applied to the surface of the glass substrate with 50 × 50 × 0.5mm and 100 × 100 × 0.5mm, and the average difference between the uniformity and the roughness of the surface vibration was increased at different time. The average difference was about 10nm. In the experiment, according to the Harvard University experiment, we found that the reflected light in different materials according to the different material and produce color differences, in the experiment germanium material deposited on the gold beryllium substrate, when the thickness of 10nm Above, the color began to produce differences from orange to blue, and by the color contrast difference to prove that the surface vibration can reach the uniformity of film thickness and roughness of the situation. And after a week after the release of the surface color changes, it is speculated that the surface germanium film should be caused by surface stress or oxidation. And to explore the different coating parameters for the infrared thermal image measurement, compared with its high-emissivity far-infrared materials, the impact of its thin film on the far-infrared radiation, through these experiments can help us understand the film thickness and substrate surface treatment differences On the impact of high emissivity far infrared radiation, and the future of the experiment will be applied to the relevant sensing, automatic detection machine, hidden code, authenticity identification, expiration date, etc., can reduce the projection of additional light source.

參考文獻


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