射頻磁控濺鍍法製備氧化鎢薄膜應用於可撓式電致色變之研究

Tungsten Oxide Films Prepared by Radio-Frequency Magnetron Sputtering for Flexible Electrochromic Application

蕭俊龍(Chun-Lung Hsiao)

指導教授 ： 莊賦祥

共同指導教授 ： 盧陽明(Yang-Ming Lu)

國立虎尾科技大學/電機資訊學院/光電與材料科技研究所/碩士(2008年)

摘要

在本研究中，利用射頻磁控濺鍍法沉積氧化鎢薄膜在片電阻為30Ω之(聚乙烯對苯二甲酸酯/氧化銦錫)塑膠基板上，改變氧化鎢參數製程，以獲得最佳鍍膜參數，並以三端電極法於1M濃度之過氯酸鋰+丙烯碳酸酯電解質混合溶液下進行電致色變薄膜特性分析。
由實驗結果顯示在氧流量5-10sccm 時氧化鎢的晶體結構均為非晶質，當氧流量為7sccm 時所製備之氧化鎢薄膜具有最佳之電致色變效果，在可見光波長550nm 處的穿透率差達到ΔT550nm=　64.1%，著去色響應時間為51秒，薄膜的著色效率CE = 17.65 cm2/C。
對氧化鎢薄膜進行可靠度測試，實驗結果發現，氧化鎢薄膜經過300 次著去色循環之後，其再現性和著去色穿透率並沒有受到太大之影響，顯示薄膜的穩定性仍相當良好。
以交流阻抗分析儀對不同氧流量之氧化鎢薄膜進行測試，由其阻抗值對頻率的變化，探討電致色變元件在界面處的鋰離子與電子之傳輸特性，配合原子力顯微鏡對表面觀測之結果，顯示表面粗糙度對電致色變具有決定性的影響。

關鍵字

射頻磁控濺鍍 ； 可撓式電致色變 ； 氧化鎢薄膜

並列摘要

In this study, the tungsten oxide films were deposited on PET/ITO（polyethylene terephthalate / indium tin oxide ; 30Ω/sq.）substrate by RF magnetron sputtering. The electrochromic properties of WO3 thin films were analyzed in a three-electrode cell with a mixture of 1 M LiClO4 and propylene carbonate solution as an electrolyte.
The results indicated that the WO3 crystal structure was amorphous at the oxygen flow rate from 5~10 sccm. The optimum condition for electrochromic occurs at the oxygen flow rate of 7sccm. The transmittance difference at 550 nm wavelength (ΔT550 nm) was 64.1% between colored and bleached states, and takes about 51 seconds. The coloration efficiency of the film is 17.65 cm2/C. The reproducibility and the transmission of colored and bleached state were not affected after 300 cycles.
Using the AC impedance spectroscopy determined the resistivity variation of WO3 films as a function of frequency from 100 kHz to 1 Hz. The resistivity variation relates with the Li+ ion and electron transport characters at the TCE/WO3 interface.
The surface roughness of WO3 films was observed by AFM and concluded a strong effect on the electrochromic properties.

並列關鍵字

R.F. magnetron sputtering ； Flexible Electrochromic ； WO3 film

參考文獻

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