本論文主要探討利用雷射光干涉檢測氧化鋁薄膜特性,實驗利用雷射光干涉實驗結合電鍍薄膜設備與電化學測試儀等設備,來量測氧化鋁薄膜厚度與電化學特性,再依據實驗量測數據來探討應力應變以及抗腐蝕效應。 實驗步驟首先利用電鍍薄膜設備在清潔後的鋁片上電鍍一層氧化鋁薄膜,運用光干涉效應的原理來量測電鍍薄膜的厚度。並利用光學顯微鏡與原子力顯微鏡來觀察薄膜表面形貌。接下來利用表面輪廓儀測試不同薄膜厚度,比較原子力顯微鏡與表面輪廓儀的差異性;之後利用牛頓環實驗,觀察不同薄膜厚度的氧化鋁薄膜之間應力應變狀態。再以實驗量測出的塔弗圖的情況,進一步了解氧化鋁薄膜的抗腐蝕效應。 經由觀察氧化鋁薄膜厚度可知,當電鍍電壓小時,電流密度比較集中,導致電鍍比較均勻。反之當電壓大時,電流密度比較發散,導致電鍍比較不均勻;最後從光學干涉實驗觀察出當厚度越大時,薄膜具有較高的抗腐蝕性;反之當厚度越小時,其抗腐蝕性較低。
This thesis explores the use of laser light interference detection characteristics of alumina films, experimental use of laser light interference experiment and plating film equipment and electrochemical measurement equipment to measure film thickness and electrochemical properties of alumina, and then measured according to experimental data to explore the effects of stress and strain, and corrosion resistance. Firstly, experimental steps plating film equipment after cleaning the aluminum layer of aluminum oxide film on the plating, the use of the principle of optical interference effects to measure the thickness of plating film. Using optical microscopy and atomic force microscope compare the surface morphology. Then use chemical testing instrument to test different thickness, more differences between the two; after the use of Newton's ring experiment to observe the alumina films with different film thickness between the stress and strain. Another is to measure out the Tafel diagram and to further understand the effect of corrosion resistance of alumina films. Known by observation of alumina film thickness, when the electroplating voltage hours, the current density is concentrated, resulting in more uniform plating. On the contrary when the voltage is large, the current density is divergence, resulting in more uniform plating; last observed from the optical interference experiment, the greater the time when the thickness of the film has high corrosion resistance; the other hand when the thickness is smaller, its resistance to corrosion than low.