A study of thermally nitrided silicon dioxide thin films for metal-oxide-silicon VLSI techology

A study of thermally nitrided silicon dioxide thin films for metal-oxide-silicon VLSI techology

劉志宏(Zhihong Liu)

香港大學/Doctor of Philosophy/Electrical and Electronic Engineering/博士(1990年)

並列摘要

無資料

並列關鍵字

Silicon oxide films ； Integrated circuits - Very large scale integration ； Metal oxide semiconductor field-effect transistors