應用於極紫外光微影之高反射率多層膜反射鏡設計、製作與特性量測

Design, Fabrication, and Characterization of High-Reflectance Multilayer Mirrors for Extreme Ultra-Violet Lithography

黃信哲(Hsin-Che Huang)

指導教授 ： 黃遠東 ； 許博淵

國立交通大學/工學院/加速器光源科技與應用碩士學位學程/碩士(2014年)

https://doi.org/10.6842/NCTU.2014.00903

摘要

本論文研究在探討應用於極紫外光微影(EUVL)之高反射率多層膜反射鏡設計、製作與特性量測。本研究在於製作傳統高反射率鉬矽多層膜反射鏡與量測極紫外光 (13.5 nm)波段之反射率並在其最上層設計一層保護層(capping layer)。經由實驗室自行撰寫的程式以及商用軟體Essential Macleod來進行設計及特性分析，以確保符合所需。研究中之製作，利用國研院儀器科技中心(ITRC)的磁控濺鍍系統製作傳統鉬矽多層膜反射鏡，利用國家同步輻射研究中心(NSRRC)的極紫外光反射儀量測其反射率。我們在所有設計的多層膜反射鏡上均製作了一層钌元素的保護層，由軟體分析可以得知反射率應可達到72.65%，經由實際量測得知其中所設計之鉬矽多層膜反射鏡最高可以達到 64.11%的反射率。並且運用原子力顯微鏡(AFM)、穿透式電子顯微鏡(TEM)以及白光干涉儀(OP)來進行樣品的結構觀察與分析。

關鍵字

極紫外光 ； 微影 ； 多層膜 ； 反射鏡

並列摘要

In this study, we designed and simulated characteristics of High-Reflectance EUV multilayer mirrors. We fabricated multilayer mirrors and designed a capping layer above the multilayer mirror. The program developed at National Chiao Tung University (NCTU) and commercial Essential Macleod software were used for our design and simulations. Si/Mo multilayer mirrors at Instrument Technology Research Center (ITRC) were fabricated by the magnetic sputter system, and their reflectances were measured at National Synchrotron Radiation Research Center (NSRRC) by the mega EUV reflectometer. All multilayer mirrors with Ru as the capping layer we fabricated. Based on simulations, the reflectance of our designed multilayer mirror is 72.65%. The highest reflectance of our fabricated samples was 64.11 % with 40 stacks measured by the mega EUV reflectometer. Finally, we applied AFM, TEM, and Optical Profile for structure observation and analysis.

並列關鍵字

EUV ； lithography ； multilayer ； reflective mirror

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