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  • 學位論文

顯影液稀釋系統探討-以12吋半導體廠為例

To investigate the Developer dilute system-an example of 12 inches semiconductor industry

指導教授 : 傅武雄

摘要


半導體產業為台灣製造業中的一大族群,其產品的製造過程中需使用到大量的顯影液。唯有提供高品質且供應無虞的化學品來因應製程不斷演進升級,讓製程中的曝光及顯影達到更精密的掌控,生產出更精密製程良率高的產品。 運用稀釋的方法不但可以降低槽車的充填次數,更可為公司省下相當龐大的原物料成本,針對低濃度、用量大的化學品,有著實質上的效益。 本研究所使用的方法是根據廠內既設的顯影液稀釋系統,經過多年的製程演變,當初所建造的系統已不敷現今12吋廠製程所需,透過此次研究所提出系統改善方法,包括相關桶槽容量/精度確認、原液/純水進料調整控制、循環幫浦效能調整、外界干擾因素控制、酸鹼滴定儀效能調整和原液濃度自動回饋機制等六項。在硬體設施改善後並進行實際測試及修正,其結果確實可達廠內製程要求的濃度規格:2.38wt%±0.001wt%,且每日供應量15,000L以上之要求。 將改善前與改善後的系統進行實際運轉測試比較,維持穩定濃度規格要求下。每日2.38wt%TMAH產量可由14,600公升提升至21,900公升,產能提升約50%,每年節省金額約6,200萬元。

關鍵字

稀釋 磅秤 幫浦 酸鹼滴定 自動回饋

並列摘要


The semiconductor manufacturing industry is a large group in Taiwan,it need to use the great amount of developer in the manufacturing process. To respond accordingly the manufacturing process continuously evolve and upgrade. Only provide high quality and abundant chemicals,so as to let manufacturing process in of expose and develop to reach the more precisely control. To produce the high accuracy and manufacturing process yield high product. Making use the dilution method can reduce the fill number of times for slot car. It is more likely to reduce the chemical cost for company. To aiming at low concentration、large usage amount chemical,they have the substantial efficiency. The method used by this research is according the developer dilute system in factory,to go through after several years of manufacturing process,the original system constructed has already been not enough to 12 inches semiconductor manufacturing process need. Via for the system improvement method, including confirm the related tank of slot capacity and accuracy、chemical and pure water feed control into the tank、circulate and transformation pump capability tune、external factor remove and control、Acid-Base titration instrument capability tune and original liquid concentration automatically feedback 6 items,etc. After the hardware facilities modifies、carry on actual test and correction. The result really can attain the manufacturing process in the factory concentration specification of the request:2.38wt%±0.001wt%,and over the 15,000L requirement every day. Before modifying with the system and after the modification through actual operation and test result by maintaining the concentration specification. The 2.38 wt% TMAH yield is increase from 14,600 liters to 21,900 liters every day. The productivity promotes 50%. The running cost reduce to reach the 62 million dollars every year.

參考文獻


[8]TMAH MSDS,力晶科技股份有限公司
[7]安全衛生宣導海報,氫氧化四甲基銨(TMAH)危害預防,行政院勞工委員會,http://laws.ilosh.gov.tw/Publish.aspx?cnid=44&P=1656
[13]Concentration Measuring Device of TMAH Solution Model SEEDA-DEV Machinery Specifications,ANAC Corp.
[1]陳欣瑜,「半導體製造業發展趨勢」,TTR台灣趨勢研究報告,第一頁,101年2月。
[2]經濟部統計處,2014年我國半導體產業產值統計,產業經濟統計簡訊182期,103年8月5日。

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