射頻離子束濺鍍(TiO2)x(Ta2O5)1-x混合膜之特性

Characteristics of (TiO2)x(Ta2O5)1-x composite films prepared by Radio Frequency Ion Beam Sputtering Deposition

吳永企(Yung-Chi Wu)

指導教授 ： 李正中

國立中央大學/理學院/光電科學研究所/碩士(2006年)

摘要

現存適合鍍膜的材料有限，混合材料的方法提供了一個解決之道。本實驗是使用射頻離子束轟擊Ta靶與Ti靶濺鍍出(TiO2)x(Ta2O5)1-x混合膜，其中x代表TiO2的混合比。所有混合膜均為非結晶結構且折射率與消光係數皆隨著Ta2O5的比例增加減小，在550nm波長的折射率範圍是2.48～2.16。在純TiO2薄膜表面觀察到有坑洞，其殘留應力為-0.516 GPa，300℃退火後就有結晶產生，而當混合膜中的Ta2O5的比例高於21%時，薄膜表面已無坑洞、殘留應力下降至-0.269 GPa，350℃退火後仍是非晶結構。(TiO2)x(Ta2O5)1-x混合膜具有較佳的熱穩定性，且可降低殘留應力變及消光係數。

關鍵字

混合膜 ； 離子束濺鍍

並列摘要

Since the coating materials are limited, mixing materials provide the way to solve the limitation. In this study (TiO2)x(Ta2O5)1-x composite films were prepared by radio frequency ion-beam sputtering deposition (RF-IBSD) of Ta and Ti targets . The symbol “x” indicate the composite fraction of TiO2 。The composite films were all amorphous structure. The refractive indices and the extinction coefficients decreased with increase of Ta2O5 in composite films. The refractive indices of composite films ranged from 2.48 to 2.16 at 550-nm wavelength. The holes was observed at surface of pure TiO2 film , the residual stress of which was -0.516 GPa. There were crystals in the pure TiO2 film after annealing at 300℃.When the fraction of Ta2O5 is above 21% in the composite films，the holes observed at surface of pure TiO2 film disappeared, and the residual stress of the composite films decrease to -0.269 GPa; the structure of composite films remained amorphous to 350℃ annealing temperature. The (TiO2)x(Ta2O5)1-x composite films have good thermal stability, and decrease residuals stress and extinction coefficient .

並列關鍵字

composite films ； ion beam sputtering deposition

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